Composite layers in Ni–P system containing TiO 2 and PTFE B. Losiewicz, A. Ste ¸pien ´, D. Gierlotka, A. Budniok * Institute of Physics and Chemistry of Metals, University of Silesia, 40-007 Katowice, Bankowa 12, Poland Received 16 July 1998; received in revised form 13 January 1999; accepted 9 February 1999 Abstract Composite Ni–P–TiO 2 and Ni–P–TiO 2 –PTFE layers were prepared by simultaneous electrodeposition of nickel and titanium dioxide (anatase) with an addition of polytetrafluoroethylene on a copper substrate from a solution in which TiO 2 and PTFE particles were suspended by stirring. The electrodeposition was carried out under galvanostatic conditions at a temperature of 293 K and current densities of j 5 and 30 A/dm 2 . The phase composition of the layers was investigated by the X-ray diffraction method. The surface morphology of the layers was examined by means of a metallographic microscope, a scanning microscope and a morphometric Supervist system. The percentage volume fraction of TiO 2 and PTFE as composite components and also their stereometric parameters were determined. It was found that the presence of PTFE has an effect on reduction of the embedded TiO 2 mean area in the Ni–P–TiO 2 –PTFE layers in comparison with the size of TiO 2 grains in the Ni–P–TiO 2 layers. q 1999 Elsevier Science S.A. All rights reserved. Keywords: Amorphous materials; Electrochemistry; Titanium oxide; X-ray diffraction 1. Introduction The modern production technology of composite layers has been well known since the 1980s. The substance of such layers is a system containing at least two coexisting phases independently nascent during a composite formation process. The composite layers can be obtained by electro- chemical methods which allow the full use of course para- meters of production process having an effect on the properties of the obtained layer. Composite layers find prin- cipal use in tribology as abrasion-resisting layers and also as electrode materials for catalysis of electrochemical reac- tions. Additionally they are excellent for corrosion resis- tance [1]. The application of electrode materials containing ruthe- nium and titanium (e.g. ruthenium–titanium oxide anodes [2], iridium–titanium oxide anodes [3], iridium–ruthenium– titanium oxide anodes [4,5] and also ceramic oxide electro- des based on a Ti/TiO 2 [6–13] system) was the inspiration for electrolytic formation of composite layers with similar dispersed oxides. Many composite coatings are character- ized by an amorphous or crystalline nickel matrix into which oxides, NiO [14], Sc 2 O 3 [15], Fe 2 O 3 [16], RuO 2 [17–19] or Al 2 O 3 [20–22], were incorporated. As composite components other chemical compounds can also be code- posited with the nickel matrix, e.g. SiC [23], BN [24,25] or PTFE [26–28]. The latter possibility of PTFE incorporation into a composite layer is of particular importance because of tribological applications. PTFE particles change the condi- tions of electrode surface wettability. In this way PTFE can improve the productivity of organic compounds during elec- trochemical processes [23,29–31]. Recently, electroactive Ni–RuO 2 materials were obtained by codeposition of nickel in a Watts bath in which RuO 2 particles were suspended by intensive mixing [32,33]. The catalytic activity of those materials appeared to depend on the RuO 2 content in the layer, and the overpotential of hydrogen evolution on such electrode materials was not large. The feasibility of utilizing such electrodes for chlor- alkali electrolysis was indicated on a laboratory scale. The type of composite components and particle size dispersed into the composite matrix determine utilizable properties of nickel composite layers. Sajfullin [34] divided these particles according to their size into ultramicro (d 1–100 nm), micro (d 0:1–10 mm) and macro (d . 10 mm). During the deposition of composite layers usually micro- and macro-particles are used. The possibility of incorporation of suspended particles from a galvanic bath into the alloy structure is not the same for all types of parti- cles. The size of particles embedded in the layer and their quantity depends on the electrodeposition conditions. In the case of such coatings, an analysis of the effect of current conditions on size and number of particles incorporated into Thin Solid Films 349 (1999) 43–50 0040-6090/99/$ - see front matter q 1999 Elsevier Science S.A. All rights reserved. PII: S0040-6090(99)00175-3 * Corresponding author. Fax: 1 48-596-929. E-mail address: [email protected] (A. Budniok)
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Composite layers in Ni±P system containing TiO2 and PTFE
B. èosiewicz, A. SteËpienÂ, D. Gierlotka, A. Budniok*
Institute of Physics and Chemistry of Metals, University of Silesia, 40-007 Katowice, Bankowa 12, Poland
Received 16 July 1998; received in revised form 13 January 1999; accepted 9 February 1999
Abstract
Composite Ni±P±TiO2 and Ni±P±TiO2±PTFE layers were prepared by simultaneous electrodeposition of nickel and titanium dioxide
(anatase) with an addition of polytetra¯uoroethylene on a copper substrate from a solution in which TiO2 and PTFE particles were suspended
by stirring. The electrodeposition was carried out under galvanostatic conditions at a temperature of 293 K and current densities of j � 5 and
30 A/dm2. The phase composition of the layers was investigated by the X-ray diffraction method. The surface morphology of the layers was
examined by means of a metallographic microscope, a scanning microscope and a morphometric Supervist system. The percentage volume
fraction of TiO2 and PTFE as composite components and also their stereometric parameters were determined. It was found that the presence
of PTFE has an effect on reduction of the embedded TiO2 mean area in the Ni±P±TiO2±PTFE layers in comparison with the size of TiO2
grains in the Ni±P±TiO2 layers. q 1999 Elsevier Science S.A. All rights reserved.
(anatase) and 40 g PTFE, respectively. TiO2 and PTFE
particles originally incorporated in the bath were examined
by morphometric analysis. The mean areas of TiO2 and
PTFE grains were measured and calculated to be respec-
tively: 6.7 mm2 and 4.9 mm2. On the basis of computer
counting the morphometric parameters like mean area of
TiO2 and similarly PTFE grains were determined. Reagents
from POCh Gliwice (Poland) of analytical purity and deio-
nized water were used for the solution. The suspension had a
pH of 4.8±5.1.
A copper plate substrate was mechanically polished on
abrasive paper and using diamond pastes, and next it was
treated for a few seconds with a dilute HNO3 solution (v/v
1:3) in order to remove impurities, and then the substrate
surface was activated for a few seconds in a dilute HCl
solution (v/v 1:3). After deposition of the layer the samples
were rinsed with water, acetone and then dried. The mass
increment of the layer was measured and estimated on the
basis of the mass difference before and after layer electro-
deposition.
The vessel diameter was 8 cm. The copper plates of one-
sided area 1 cm2 were placed parallel to the bottom of the
vessel. Electrodeposition was conducted in the electrolytic
cell containing 400 cm3 of the solution. The other side of the
plates was covered with non-conducting resin. The distance
between the plates and the surface of the solution was 5 cm.
The counter electrode was made of platinum mesh with the
geometric area of 1 dm2. The process of deposition for both
types of layers was carried out at 293 K and at the current
densities of j � 5 and 30 A/dm2 for 80 and 15 min, respec-
tively. Under these conditions the solution mixing rate of
300 rev/min was applied. The thickness of the deposited
layers was found to be about 25 mm.
B. èosiewicz et al. / Thin Solid Films 349 (1999) 43±5044
Fig. 1. The surface morphology of the Ni±P±TiO2 layers obtained at j � 5 A/dm2 (a) and at j � 30 A/dm2 (c) at 293 K, and appropriate micrographs (b,d) used
for the morphometric analysis.
Using the stereometric quantitative microscopy method
with a Nikon Alphaphot metallographic microscope
(magni®cation 450 £ ) and a computer Supervist system
for morphometric analysis, the surface morphology of the
Ni±P±TiO2 and Ni±P±TiO2±PTFE layers was examined.
The stereological parameters of those layers with a metric
character obtained by measurements (e.g. mean radius of
grain, mean perimeter of grain, mean area of grain, Martin's
diameters) and the ones with a topological character
obtained by computer counting (e.g. number of grains per
area unit, sum of grain boundaries per area unit, shape
factors, percentage volume fraction of composite compo-
nents TiO2 and PTFE), were measured and calculated.
The principle of the morphometric analysis is based on a
program which can make a digital conversion of a `living'
image of the layer surface observed under a microscope by
means of a digital camera and appropriate computer card
[35]. From the `living' image the area in the optical plane
containing subjectively the largest quantity of phase/phases
observed was chosen. Computer analysis of the digital
image yields a chance to display that image as a luminance
with 256 grey shades. It also allows us to select the searched
phase/phases with a precise grey shade grade from the
observed area. In this way the selected objects with an iden-
tical brightness threshold were marked in one colour and cut
out from the `frozen' image and then subjected to the
morphometric measurements. The micrographs used for
the morphometric analysis with the selected phases for the
Ni±P±TiO2 and Ni±P±TiO2±PTFE layers are shown in Figs.
1 and 2. Such prepared images allowed us to execute the
arithmetical and logical operations. The calculations were
given as average values. The measurements for each layer
were repeated 5 times. The measuring error for the obtained
results was about 3±5%.
The coating cross-sections were investigated using a digi-
tal scanning microscope (magni®cation 500 £ ). The phase
compositions of the layers were examined by X-ray diffrac-
tion using a Philips diffractometer and Cu Ka radiation.
3. Results and discussion
The composite Ni±P±TiO2 layer electrodeposited at
j � 5 A/dm2 (Fig. 1a) exhibits many microcracks in contrast
to the same layer obtained under high current conditions of
j � 30 A/dm2 (Fig. 1b). In both cases the TiO2 particles are
uniformly embedded into the nickel matrix with a tendency
to agglomeration.
The Ni±P±TiO2±PTFE layer electrodeposited at j � 5 A/
dm2 exhibits stresses causing separation from the copper
B. èosiewicz et al. / Thin Solid Films 349 (1999) 43±50 45
Fig. 2. The surface morphology of the Ni±P±TiO2±PTFE layers obtained at j � 5 A/dm2 (a) and at j � 30 A/dm2 (c) at 293 K, and appropriate micrographs
(b,d) used for the morphometric analysis.
substrate (Fig. 2a). PTFE particles create large agglomerate
clusters on the surface of the layers. In contrast, the same
layer obtained at j � 30 A/dm2 shows good adherence to the
copper substrate. The PTFE particles are homogeneously
embedded in the amorphous nickel matrix (Fig. 2b).
Composite Ni±P±TiO2 and Ni±P±TiO2±PTFE layers are
mat-grey with a visible white tarnish on the surface. Both
types of coatings obtained under low current conditions
exhibit microcracks on the surface. The increase in current
density improves the adherence to the copper substrate and
the uniform embedding of composite components into the
nickel matrix.
The microscopic cross-section image of a Ni±P±TiO2
layer electrodeposited at j � 5 A/dm2 is characterized by
more compact and homogeneous character of the coating
in comparison with the cross-section image obtained for the
same type of layer under high current conditions (Fig. 3a,b).
The microscopic cross-section image of Ni±P±TiO2±PTFE
layer electrodeposited at the current density of j � 5 A/dm2
indicates an incorporation of PTFE particles into the layer
causing an increase in its real surface (Fig. 4a). In the
instance of the same layer electrodeposited at j � 30 A/
dm2 the presence of PTFE in the layer does not cause
such considerable surface development as found in low
current density deposition (Fig. 4b). Consistently, an
increase in electrodeposition current density causes a
decrease in a degree of real surface development of Ni±P±
TiO2±PTFE layer. The cross-section of composite layers
with modi®ed PTFE indicates the presence of built-in
PTFE particles into the amorphous Ni±P matrix containing
also TiO2 as a composite component causing an increase in
real surface of these layers in comparison with the Ni±P±
TiO2 coatings. It is irrespective of electrodeposition current
conditions observed.
Besides, the morphology of the Ni±P±TiO2±PTFE layers
reveals a greater number of microcracks, which probably
in¯uence the increase in the surface roughness, than the
Ni±P±TiO2 layer morphology. The PTFE presence in the
Ni±P±TiO2±PTFE layer has an effect on the microscopic
shape inhomogeneity of embedded particles, their size and
distribution in the composite matrix in comparison with the
Ni±P±TiO2 inhomogeneity. That presence also increases the
compact Ni±P±TiO2 layer cracking, which loads to the
formation of dendritic Ni±P±TiO2±PTFE coating. The
PTFE incorporation in the amorphous matrix with titanium
dioxide also causes the growth of the sum of grain bound-
aries for all particles incorporated in the matrix. The Ni±P±
TiO2 layers contain a smaller number of titanium dioxide
B. èosiewicz et al. / Thin Solid Films 349 (1999) 43±5046
Fig. 3. Microscopic cross-section of the Ni±P±TiO2 layers obtained at
j � 5 A/dm2 (a) and at j � 30 A/dm2 (b) at 293 K.Fig. 4. Microscopic cross-section of the Ni±P±TiO2±PTFE layers obtained
at j � 5 A/dm2 (a) and at j � 30 A/dm2 (b) at 293 K.
grains per mm2 than the coatings with embedded PTFE. The
embedded particle mean area in case of the Ni±P±TiO2±
PTFE layer is smaller than the mean area of TiO2 particles
embedded in the Ni±P±TiO2 layer. The other stereological
parameters like mean radius of grain, mean perimeter of
grain, Martin's diameters of embedded particles in the
layer containing PTFE are also characterized by smaller
values than corresponding parameters values of the Ni±P±
TiO2 layer. In consequence of this fact, the Ni±P±TiO2±
PTFE layer microstructure distinguishes a very probable
increase in the real surface development.
The phase composition analysis of Ni±P±TiO2 and Ni±P±
TiO2±PTFE layers revealed that the structure of these layers
is characterized by the existence of an amorphous Ni±P
matrix with crystalline titanium dioxides as composite
components in the range of angles 2u corresponding to
the Ni±P system (Fig. 5). The diffraction pattern obtained
for Ni±P±TiO2±PTFE composite layer is cheracterized by
higher background level. This fact can be caused by the
presence of embedded PTFE in the amorphous Ni±P matrix.
However, there are crystalline titanium dioxides together
with the amorphous Ni±P matrix as was found in typical
diffraction patterns of Ni±P±TiO2 layers [36].
In a morphometric analysis the stereometric parameters
for both types of testing coatings such as number of grains,
percentage volume fraction of composite phases TiO2 and
PTFE, area of grain, radius of grain, perimeter of grain, sum
of grain boundaries, number of grains and their perimeter
per mm2, Martin's diameters and shape factors were
measured and evaluated. The percentage volume fractions
of TiO2 and PTFE particles embedded into the layers were
also determined.
Irrespective of deposition current conditions of Ni±P±
TiO2 layers it was ascertained that in the composite layer
conglomerates of TiO2 are built in with a mean area of
surface about a dozen times higher than TiO2 particles
primarily existing in the bath (Table 1). This tendency to
conglomeration appears even more at lower current density
of electrodeposition. An argument for this fact could be
ascertained in a smaller number of TiO2 grains and a smaller
sum of all grain boundaries per 1 mm2 occurring on the
surface.
The values of Martin's diameters V and H (vertical and
horizontal lengths of sections dividing a grain into two parts
with the same area) and shape factors k1 and k2 of titanium
dioxide grains are comparatively contained in a limit of
error and in both cases point at regular, spherical shape of
built-in TiO2 particles. The micrographs of Ni±P±TiO2
surface layers also con®rm this.
Also for Ni±P±TiO2±PTFE layers it was found that inde-
pendently of the deposition current such layer conglomer-
ates of TiO2 1 PTFE are built in with mean area of surface
about a dozen times higher than the mean surface area of
TiO2 grains and simultaneously repeatedly higher than the
surface area of PTFE grains originally incorporated into the
bath (Table 1). However, the mean surface area of TiO2 1PTFE grains embedded into Ni±P±TiO2±PTFE layer is
considerably smaller than the corresponding size of TiO2
particles incorporated into Ni±P±TiO2 layer. Besides, the
fact that the tendency to conglomeration for Ni±P±TiO2±
PTFE layers is smaller than in the case of Ni±P±TiO2 layers
is surely caused by the in¯uence of PTFE presence. Consis-
tently, in spite of a comparable volume fraction of compo-
site component in both types of layers, the number of grains
per area unit in the case of Ni±P±TiO2±PTFE layer is
considerably higher than for Ni±P±TiO2 layer. The increase
B. èosiewicz et al. / Thin Solid Films 349 (1999) 43±50 47
Fig. 5. X-ray diffraction patterns of Ni±P±TiO2 and Ni±P±TiO2±PTFE layers.
in deposition current density of Ni±P±TiO2±PTFE layer
causes ®rst of all the reduction of percentage contents of
composite components, which contributes to the diminution
of grain number per area unit. This smaller number of grains
shows an almost identical value of sum of grain boundaries
per area unit. On this basis we assume that for Ni±P±TiO2±
PTFE layers at higher deposition currents a conglomeration
effect occurs. The proof of this fact is higher values of grain
areas and values of Martin's diameters at higher deposition
current density of Ni±P±TiO2±PTFE layer. Composite Ni±
P±TiO2 layers are characterized by a higher number of TiO2
than comparable Ni±P±TiO2±PTFE layers which can be
explained by the higher electrical resistance during the elec-
trodeposition process of Ni±P±TiO2±PTFE layer in conse-
quence of the presence of non-conducting PTFE particles
present in the electrolyte.
Based on the morphometric analysis of both types of
layers the detailed classi®cation of built-in TiO2 and PTFE
grains with regard to their area size was done. For Ni±P±
TiO2 layer electrodeposited at j � 5 A/dm2 over 48% of
TiO2 grains with mean surface area below 15 mm2 and
simultaneously about 30% of the same type of grains and
their agglomerates with the area size over 100 mm2 were
found (Fig. 6). In the instance of the same layer obtained
at the current density of j � 30 A/dm2 the number of grains
from the range below 15 mm2 shows a gain of 20%, while
the number of built-in large grains drops down to 25%.
From these results it is unequivocally evident that the
increase in deposition current density results in a higher
number of built-in grains with the least area of 15 mm2
creating in this way a more homogeneous structure of the
layer surface. The smaller are the particles of the dispersed
phase the easier are the conditions of their embedding into
the amorphous nickel matrix. This effect can be connected
with the fact that smaller particles move faster in an electric
®eld and the motion of the larger particles is slower.
B. èosiewicz et al. / Thin Solid Films 349 (1999) 43±5048
Table 1
Stereometric parameters for the Ni±P±TiO2 and Ni±P±TiO2±PTFE layers obtained at 293 K