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6.776 High Speed Communication Circuits Lecture 6 MOS Transistors, Passive Components, Gain- Bandwidth Issue for Broadband Amplifiers Massachusetts Institute of Technology February 17, 2005 Copyright © 2005 by Hae-Seung Lee and Michael H. Perrott
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6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

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Page 1: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

6.776High Speed Communication Circuits

Lecture 6MOS Transistors, Passive Components, Gain-

Bandwidth Issue for Broadband Amplifiers

Massachusetts Institute of TechnologyFebruary 17, 2005

Copyright © 2005 by Hae-Seung Lee and Michael H. Perrott

Page 2: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Basics of MOS Large Signal Behavior (Qualitative)

S D

G

Cchannel = Cox(VGS-VT)

VGS

VDS=0

S D

GVGS

VD=∆V

S D

GVGS

VD>∆V

Triode

Pinch-off

SaturationVDS

ID

ID

ID

ID

Triode

Pinch-offSaturation

∆V

Overall I-V Characteristic

Page 3: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Basics of MOS Large Signal Behavior (Quantitative)

S D

G

Cchannel = Cox(VGS-VT)

VGS

VDS=0

S D

GVGS

VD=∆V

S D

GVGS

VD>∆V

Triode

Pinch-off

Saturation

ID

ID

ID

ID = µnCoxWL

(VGS - VT - VDS/2)VDS

ID µnCoxWL

(VGS - VT)VDS

for VDS << VGS - VT

ID = µnCoxWL

12

(VGS-VT)2(1+λVDS)

(where λ corresponds tochannel length modulation)

∆V = VGS-VT

∆V =µnCoxW

2IDL

Page 4: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Analysis of Amplifier Behavior

Typically focus on small signal behavior- Work with a linearized model such as hybrid-π

To do small signal analysis:

RS

RG

RD

vinvout

Vbias

ID 1) Solve for bias current Id2) Calculate small signal parameters (such as gm, ro)3) Solve for small signal response using transistor hybrid-π small signal model

Small Signal Analysis Steps

Page 5: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

MOS DC Small Signal Model

Assume transistor in saturation:

RS

RG

RDRD

RS

RG

-gmbvsvgs

vs

rogmvgs

gm = µnCox(W/L)(VGS - VT)(1 + λVDS)

= 2µnCox(W/L)ID (assuming λVDS << 1)

Cox

2qεsNA

2 2|Φp| + VSB

γgm where γ =gmb =

In practice: gmb = gm/5 to gm/3

λID1ro =

ID

Page 6: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Capacitors For MOS Device In Saturation

S D

GVGS

VD>∆V

ID

LDLD

overlap cap: Cov = WLDCox + WCfringe

B

CgcCcb

Cov

CjdbCjsb

Cov

Side View

gate to channel cap: Cgc = CoxW(L-2LD)

channel to bulk cap: Ccb - ignore in this class

S D

Top View

W

E

L

E

E

source to bulk cap: Cjsb = 1 + VSB ΦB

Cj(0)

1 + VSB ΦB

Cjsw(0)WE + (W + 2E)

junction bottom wall cap (per area)

junction sidewall cap (per length)

drain to bulk cap: Cjdb = 1 + VDB ΦB

Cj(0)

1 + VDB ΦB

Cjsw(0)WE + (W + 2E)

23

(make 2W for "4 sided" perimeter in some cases)

L

Page 7: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

MOS AC Small Signal Model (Device in Saturation)

RS

RG

RD

RD

RS

RG

-gmbvsvgs

vs

rogmvgs

ID

Csb

Cgs

CgdCdb

Cgs = Cgc + Cov = CoxW(L-2LD) + Cov23

Cgd = Cov

Csb = Cjsb (area + perimeter junction capacitance)

Cdb = Cjdb (area + perimeter junction capacitance)

Page 8: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Wiring Parasitics

Capacitance- Gate: cap from poly to substrate and metal layers- Drain and source: cap from metal routing path to

substrate and other metal layersResistance- Gate: poly gate has resistance (reduce by silicide) long

metal lines can add resistance- Drain and source: some resistance in diffusion region

(reduce by silicide), and from routing long metal linesInductance- Gate: poly gate has negligible inductance, but long

wires can add inductance- Drain and source: becomes an issue for long wires

Extract these parasitics from circuit layout

Page 9: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Frequency Performance of a CMOS Device

Two figures of merit in common use- ft : frequency for which current gain is unity- fmax : frequency for which power gain is unity

Common intuition about ft- Gain, bandwidth product is conserved

- We will see that MOS devices have an ft that is a function of bias

This effect strongly impacts high frequency amplifier topology selection

Page 10: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Derivation of ft for MOS Device in Saturation

-gmbvsvgs rogmvgs

ID+id

Csb

Cgs

CgdCdb

iinVbias

RLARGE

id

iin

Assumption is that input is current, output of device is short circuited to a supply voltage- Note that voltage bias is required at gate

The calculated value of ft is a function of this bias voltage

Page 11: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Derivation of ft for MOS Device in Saturation

-gmbvsvgs rogmvgs

ID+id

Csb

Cgs

CgdCdb

iinVbias

RLARGE

id

iin

Page 12: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Derivation of ft for MOS Device in Saturation

1

idiin

fft

slope = -20 dB/dec

Page 13: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Why is ft a Function of Voltage Bias?

ft is a ratio of gm to gate capacitance- gm is a function of gate bias, while gate cap is not (in strong

inversion)First order relationship between gm and gate bias:

- The larger the gate bias, the higher the value for ft

Alternately, ft is a function of current density

- So ft maximized at max current density (and minimum L)

Page 14: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Unity Power Gain Frequency fmax

From pages 176-178 (2nd ed.) 70-72 (1st ed.) of text book for derivation on fmax

rg is the series parasitic gate resistancefmax can be much higher than fT: make gate resistance small (by careful layout)Output capacitance has no effect (can be tuned out by inductor)

Page 15: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Speed of NMOS Versus PMOS Devices

NMOS devices have much higher mobility than PMOS devices (in typical bulk CMOS processes)

- NMOS devices provide approximately 2.5 x gm for a given amount of capacitance and gate bias voltage

- Also, NMOS devices provide approximately 2.5 x Id for a given amount of capacitance and gate bias voltage

Page 16: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Integrated Passive Components for RF Circuits

We will only consider passive components appropriate for RF useHigh Q, low parasitics, and good linearity are generally desired (bias circuit is an exception)Well resistors, diffused resistors, poly-n+ capacitors even poly-poly capacitors do not perform very well in these regards

Page 17: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Polysilicon Resistors

Use unsilicided polysilicon to create resistor

Key parameters- Resistance (usually 100- 200 Ohms per square)- Parasitic capacitance (usually small)

Appropriate for high speed amplifiers- Linearity (excellent)- Accuracy (usually can be set within ± 15%)

A

Rpoly

B

B

A

Page 18: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

MOS Resistors

Bias a MOS device in its triode region

High resistance values can be achieved in a small area (MegaOhms within tens of square microns)Parasitic capacitance is large (gate capacitance!)Resistance is quite nonlinear- Appropriate for small swing circuits or DC (bias) circuits

AW/LRds

B A B

Page 19: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

High Density Capacitors (Biasing, Decoupling)

MOS devices offer the highest capacitance per unit area- Voltage must be high enough to invert the channel

Key parameters- Capacitance value

Raw cap value from MOS device is about 8-8.5 fF/µ2 for 0.18u CMOS

- Q (i.e., amount of series resistance)Maximized with minimum L (tradeoff with area efficiency)

A

W/L

A

C1=CoxWL

Page 20: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

MOS Capacitors, Cnt’d

Putting NMOS capacitor in NWell allows operation at lower voltage

The non-linearity is often exploited in VCO designs as varactors

C

VVT

COX

NMOS on substrate

NMOS in N-well

V

+

-

COVNwell

n+ n+

poly

Page 21: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

High Q Capacitors (Signal Path)

Lateral metal capacitors offer high Q and reasonably large capacitance per unit area- Stack many levels of metal on top of each other (best

layers are the top ones), via them at maximum density

- Accuracy often better than ±10%

- Parasitic cap is symmetric, typically less than 10% of cap value

B

A

C1

A

B

Page 22: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Stacked Lateral Flux Capacitor

Example: C = 1.5 fF/µm2 for 0.24µm process with 7 Tmetals, Lmin = Wmin = 0.24µm, tmetal = 0.53µm

-See “Capacity Limits and Matching Properties of Integrated Capacitors”, Aparicio et. al., JSSC, Mar 2002

Page 23: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Fractal Capacitor

Maximizes perimeter area: up to 10x increase in unit capacitance

Limited by lithographySee A. Shanhani et. al., “A 12 mW, Wdie Dynamic Range CMOS Fron-End Circuit

for Portable GPS Receiver,” Digest of Technical Papers, ISSCC 1997

Figure by MIT OCW.

Page 24: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Spiral Inductors

Create integrated inductor using spiral shape on top level metals (may also want a patterned ground shield)

- Key parameters are Q (< 10), L (1-10 nH), self resonant freq.- Usually implemented in top metal layers to minimize series

resistance, coupling to substrate- See using Mohan et. al, “Simple, Accurate Expressions for

Planar Spiral Inductances, JSSC, Oct, 1999, pp 1419-1424- Verify inductor parameters (L, Q, etc.) using ASITIC

http://formosa.eecs.berkeley.edu/~niknejad/asitic.html

Lm

A

BB

A

Page 25: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Bondwire Inductors

Used to bond from the package to die- Can be used to advantage

Properties- Inductance ( ≈ 1 nH/mm – usually achieve 1-5 nH) - Inductance value is difficult to control (chip-package

alignment, bondwire height, etc.)- Q (much higher than spiral inductors – typically > 40)

Cpin

Lbondwire

Cbonding_pad

dieAdjoining pins

package

To chip circuitsFrom board

Page 26: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Integrated Transformers

Utilize magnetic coupling between adjoining wires

Key parameters- L (self inductance for primary and secondary windings)- k (coupling coefficient between primary and secondary)

Design – ASITIC, other CAD packages

A B

L2

B

L1

A

Cpar1

kC D

C DCpar2

Page 27: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

High Speed Transformer Example – A T-Coil Network

A T-coil consists of a center-tapped inductor with mutual coupling between each inductor half

Used for bandwidth enhancement- See S. Galal, B. Ravazi, “10 Gb/s Limiting Amplifier and

Laser/Modulator Driver in 0.18u CMOS”, ISSCC 2003, pp 188-189 and “Broadband ESD Protection …”, pp. 182-183

A B

X

L2

B

L1

A

CB X

k

Page 28: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

Broadband Amplifiers

H.-S. Lee & M.H. Perrott MIT OCW

Page 29: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

High Frequency, Broadband Amplifiers

The first thing that you typically do to the input signal is amplify it

Function

VLC1 RL

L1Delay = xCharacteristic Impedance = Zo

Transmission Line

Z1

VinC2

dieAdjoining pinsConnector

Controlled ImpedancePCB trace

package

On-ChipDrivingSource

AmpVout

- Boosts signal levels to acceptable values- Provides reverse isolation

Key performance parameters- Gain, bandwidth, noise, linearity

Page 30: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Gain-bandwidth Trade-off

Common-source amplifier example

Vdd

Vbias

vin

Ctot

RL

vo

+-

Ctot: total capacitance at output node+-

DC gain

3 dBbandwidth

Gain-bandwidth

Page 31: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Gain-bandwidth Trade-off

Common-source amplifier example

RL=RL1

RL=RL3

RL=RL3

Given the ‘origin pole’ gm/Ctot, higher bandwidth is achieved only at the expense of gainThe ‘origin pole’ gm/Ctot must be improved for better GB

Page 32: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Gain-bandwidth Improvement

How do we improve gm/Ctot?Assume that amplifier is loaded by an identical amplifier and fixed wiring capacitance is negligibleSince and

To achieve maximum GB in a given technology, use minimum gate length, bias the transistor at maximum

When velocity saturation is reached, higher does not yield higher gmIn case fixed wiring capacitance is large, power consumption must be also considered

Page 33: 6.776 High Speed Communication Circuits Lecture 6 …...Capacitors For MOS Device In Saturation SD G V GS V D >∆V I D L D L D overlap cap: C ov = WL DC ox + WC fringe B C gc C cb

H.-S. Lee & M.H. Perrott MIT OCW

Gain-bandwidth Observations

Constant gain-bandwidth is simply the result of single-pole role off – it’s not fundamental!It implies a single-pole frequency response may not be the best for obtaining gain and bandwidth simultaneouslySingle-pole role off is necessary for some circuits, e.g. for stability, but not for broad-band amplifiers