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4002.EDIC Lecture 6 180806

Apr 09, 2018

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    ELECTRONIC DEVICES AND

    INTEGRATED CIRCUITS (EL2006)

    LECTURE 6

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    Last Class Compensation and space charge

    neutrality : A compensatedsemiconductor is one, whichcontains both donor and acceptortype impurities in the sameregion, po + Nd

    + = no + Na- ,

    Degenerate and nondegeneratesemiconductors : If material hasbeen doped too heavily ~ 1020

    atoms cm-3. One of theapplications is in Tunnel diode.

    Drift of carriers in electric andmagnetic fields :

    xx EJ .

    xx EJ .*

    /. nn mtq

    xx Ev / xnx EnqJ ...

    J = q( n n + p p) . EX

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    Todays class

    # Drift of carriers in electric and magnetic fields Drift and resistance : Evaluating expression for resistivity

    Effect of temperature and doping on mobility : Effect of impurityand lattice scattering

    High field effects : What happens, if field is increased beyond alimit.

    Hall Effect : Useful effect, which helps in getting to know acouple of parameters

    # Invariance of the Fermi level at equilibrium

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    Drift and Resistance

    If this barcontains bothtypes of

    carriers, then Iget value ofconductivity i.e.

    xpnx EpnqJ)..(

    Now, we know that

    1

    ..

    .

    tw

    L

    tw

    LR is the

    resistivity

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    Two basic types of scattering mechanisms thatinfluence electron and hole mobility areLattice scattering Impurityscattering

    A carrier moving through the crystalis scattered by a vibration of the

    lattice , resulting from the

    temperature. Collective vibration of

    atoms in the crystal are termed as

    phonons. Thus lattice scattering isalso known as phonon scattering.

    Due to the

    scattering from

    crystal defects such

    as ionizedimpurities

    EFFECT OF TEMPERATURE AND

    DOPING ON MOBILITY

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    Temperature Frequency of

    lattice scattering

    events

    Mobility

    Temperature

    (At higher

    temperatures)

    (At lower

    temperatures)

    Frequency

    of impurity

    scattering

    Mobility

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    The approximate temperature dependence

    for lattice and impurity scattering is T-3/2

    andT3/2 respectively.

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    Hence , the mobilities due to two or more

    scattering mechanisms add inversely .

    1 = 1 + 1

    1 2

    So, that is why, the mechanism causing

    the lowest mobility value dominates.

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    Mobility and impurity concentration :

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    Material Mobility(Cm2 / V sec)

    Intrinsic silicon at 300 K 1350

    Silicon with a donor concentration 700

    Of about 1017 Cm-3

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    HIGH FIELD EFFECTS

    Jx = . Ex

    While writing down this eq. it was assumed that the drift

    current is proportional to the electric field and that the

    proportionality constant ( ) is not a function of E. This

    assumption is valid over a wide range of E

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    The current density resulting from the net drift of carriers is justthe number of electrons crossing a unit area per unit time( n < vx > ) multiplied by the charge on the electron ( - q ) :

    Jx = - q. n . < vx >where < vx > is the average velocity

    So, this term velocity is very much coming in

    the expression for current density.

    HIGH FIELD EFFECTS ( Contd.)

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    This dependence of upon E is an

    example of hot carrier effect, which

    implies that the carrier drift velocity vx is

    comparable to the thermal velocity vth (

    ~ 107

    cm / sec).

    HIGH FIELD EFFECTS (Contd.)

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    HIGH FIELD EFFECTS ( Contd.)

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    HIGH FIELD EFFECTS ( Contd.)

    Point of saturation represents a situationat which added energy imparted by the

    electric field is transferred to the lattice

    rather than increasing the carrier velocity.

    The result of this scattering limited velocity is

    a fairly constant current at high field.

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    Hall Effect

    Ix

    Ix

    (+) (-)

    Bz

    Ex

    EyA B

    D

    E

    t

    w

    L

    magnetic field applied to directionof hole drift (p-type bar).

    Path of holes deflected in -y direction.

    x

    y

    z

    Fy = q(Ey - vxBz)

    To maintain flow of holes

    down the bar, an electric field

    (Ey) needs to be established tobalance force.

    Ey = vxBz

    VAB

    =Eyw

    Hall voltage

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    Hall Effect

    0,

    0

    1

    qpRBJRBqp

    J

    E HzxHzx

    y

    AB

    zx

    AB

    zx

    y

    zx

    H qtV

    BI

    wVq

    BwtI

    qE

    BJ

    qRp

    )/(

    )/(10

    wtL

    IV

    L

    Rwtcm xCD

    /

    /)(

    H

    H

    p

    R

    qRqqp

    )/1(

    /1

    0

    Hall coefficient

    Hole

    concentration

    Measurable

    quantities}

    xx vqnJ

    Current density

    Drift velocity

    conductivity

    mobility

    Applications

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    Invariance of the Fermi level

    at equilibrium

    ## Technologically very important

    section

    Basically tells us that what will happen,

    when two materials with their Fermi levelsat different position will be brought in closeintimacy.

    I i f th F i l l t ilib i (

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    We consider two materials in intimate contactsuch that electrons can move between the two as

    shown below :

    Material 1

    Density of states N1 ( E)

    Fermi distribution f1 ( E)

    E

    X

    N2 ( E)

    f2( E)

    Ef

    Invariance of the Fermi level at equilibrium (

    Contd.)

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    I i f h F i l l

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    At Equilibrium , these two must be equal :

    N1(E).f1(E). N2(E) [ 1f2(E) ] = N2(E).f2(E). N1(E) [ 1f1(E) ]

    Rearranging terms , we have at energy E :

    N1.f1.N2N1. f1.N2 . f2 = N2. f2 .N1N2. f2. N1. F1

    Invariance of the Fermi level

    at equilibrium ( Contd.)

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    f1 ( E) = f2 ( E )

    Hence , we can state that the Fermilevel at equilibrium must be constant

    through materials in intimate contact.

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    Thanks