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A ABIOS(Advanced Basic I/O System) PC실모드 BIOS유사한 루틴들의 집합이고, ABIOS보호모드로 작동되도록 설계된 것이다. Abrasive 성형 완료된 PKG리드프레임에 잔존하는 수지 피막을 제거하기 위해 사용된 연마제. Absorption Constant (흡수상수) 매질이 빛을 흡수하는 정도를 나타낸 고유값. Absorption Dichroism (흡수 이색성) 축성액정에 있어서 광의 편광 방향에 의해 광의 흡수정도가 다른 현상으로 직선 편광의 진동 방향의 차이에 의해 흡수계수가 직선 이색성 또는 선광성을 나타내는 용액등에 있어서 죄우 원편광의 흡수계수가 다른 원판광 이색성등의 종류가 있다. Accel Mode 이온 주입시 가속에너지를 가해 상태에서 주입하는 형태 (에너지 범위 32-200KeV.) AC Characteristic Device동작시 갖고 있는 특성 입출력 파형의 Timimg 관련한 여러 가지 특성을 말함. Acceptable Quality Level 합격품질수준. Sampling에서, 만족할 만한 공정평균으로 생각할 있는 Lot 혹은 Batch내의 최대 변동수(variant unit)한다. 변동수(variant unit)라는 말은 이상 정도 또는 결함(불량)정도라 보다 국한된 의미의 단어로 대체할 수도 있다. Acceptance Sampling 제품 혹은 재화의 .부판정을 위한 Sampling 검사 , Sampling검사에 의거하여 ,부판정을 하는 절차에 관한 방법을 말한다. Acceptance Tests (인수시험) 공급자가 구매자간에 제품을 인수할 것인가를 동의하거나 결정하는데 필요한 테스트. Acceptor 3가의 불순물을 실리콘에 주입하면 공유결합에 의해 (hole;정공)만드는데 이때 3가의 불순물을 Acceptor한다. Acceptor Level(Acceptor 준위)
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AABIOS(Advanced Basic I/O System)PC BIOS , ABIOS .

Abrasive PKG .

Absorption Constant () .

Absorption Dichroism ( ) .

Accel Mode ( 32-200KeV.)

AC CharacteristicDevice Timimg .

Acceptable Quality Level. Sampling, Lot Batch (variant unit) . (variant unit) () .

Acceptance Sampling . Sampling , Sampling , .

Acceptance Tests () .

Acceptor3 (hole;) 3 Acceptor .

Acceptor Level(Acceptor )

Hole P Level Acceptor Level .

ACI (After Cleaning Inspection) , , , CD(Critical Dimension : ) .

Active Matrix Drive ( ) contrast response . .

AccumulationMOSGate Bias silicon surface Gate Majority Carrier(, substrate Carrier) Density .

Accuracy, .

Active Element () . .

ADART (Automatic Distribution Analysis in Real Time) Program, .

A/D Converter (Analog to Digital Converter) "1" "0" . ADC .

Additive Process ( ; ) .

Address Pre-DecoderRow/Column Address Decoding Address Buffer internal Address AN, / AN Decoding .

Addressing Technology ( ) LCD -Addressing .

Adhesion WF WF . ( )

ADI(After Development Inspection) , Pattern , CD .

Agitation() WF

AGV(Automatic Guided Vehicle, ) Intra-bay cassette 6 . LCD lot .

AH (Absolute Humidity) .

AHU (Air Handling Unit) , , Particle .

Air Gun , .

Air ShowerFAB Line , box .

Alignment WF mask . Ali gner() .

Alignment Mark Align Align .

AlloySi AI .

ALPG (Algorithmic Pattern Generator) Device Data , instruction Coding

Alpha-particle He() U Th trace contamination IC , sillicon hole-electron pairs Soft error .

Al-TargetWafer Al() Al.

Ambient Carrier Gas (N2, O2, H2)

AMLCD (Active Matrix Liquid Crystal Display) .

Amorphous Silicon .

Amplification( ) .

Analog .

Analog IC IC .

Analog Memory

Analysis of Variance (ANOVA) .

Analyzer Wafer .

Anelva

(Al, Cu, Ti ) , .

Angstrom () 1 =110-8 cm H+ = 0.059210-8

AniconLTO(Low Temperature Oxide) deposition

Anisotropic Etching , () Isotropic Etching ( )

Annealing , Si N2 Ar gas Oxide quality bulk silicon defect damage cure .

Annular Ring ( ) .

Anode . .

ANSI (American National Standard Institute) .

AntimonyWafer , N Sb.

Anti ReflectPolycide silicon 11.0 photo pattern . SiO2 TiN silicide pattern TiN ARC .

Antistatic

AOQ (Average Outgoing Quality) lot lot . (AOQ)= LOT LOT >

AOQL (Average Outgoing Quality) : AOQ

Application Test() , .

APCVDAtmospheric Dressure CVD(Chemical Vapor Deposit-ion). (Vapor) , Gas Chamber .

APD (Avlanche Photo Diode) PN Photo Diod e.

AQL (Acceptable Quality Level) Sampling lot , lot .

ArArgon Gas

Arc Chamberlon .

Arc CurrentPlasma Bean Arc Chamber

ARL (Acceptable Reliability Level) .

Array Device .

Array LogicFILP-FLOP, NAND, NOR, Diode Logic Circuit Array () Device.

Artwork Master Film 1:1

As (Arsenic)

Ashing/ (Dry Strip) .

ASIC (Application Specific IC) (), () IC , IC .

ASIC Memory Memory. Computer Multi-port Video RAM(VRAM), data cache memory , dark memory . Frame memory Line memory . Dual-port memory FIFO(First In First Out) .

ASIC miconUser 1chip micon. microprocessor microcontroller CPU(CPU core ), CPU, ROM, RAM, Random Logic User system 1 chip . User , , , .

Aspect RatioStep Coverage .

Assembly .

ASRP (Autoexec Spreading Resistance Probe)Silicon Wafer .

Assignable Cause .

ASSP (Application Specific Standard Product) IC. user IC, , IC , Printer controller .

ATE (Automatic Test Equipment) Test .

Au-Bond (gold ball Bond) Bonding

Auto-Doping .

Auto Loader (FAB, TEST, ASS'Y) .

Automatic Loading SystemCarrier Wafer .

Auto TransferWafer Boat Loading Unloading .

Auto Transport System ( ) computer system System.

Av Voltage Gain,

AV TFT-LCD(AUDIO-VIDEO, TFT-LCD), TFT-LCD 1.1 inch 12 .

Avalanche breakdownPin Diode (reverse bias) breakdown Zener breakdow n mechanism doping Junction transition region Field electron electron-hole pairs impact ionization mechanism carrier Breakdown .

Avalanche Injection Diode P+ N+ Diode

Avalanche Transistor TR TR OFF Avalanche Breakdown ON .

Average Outgoing Quality Level (AOQL). sampling , (AOQ) .

A.W.W (Acid Waste Water) .

Axial Fan Fan Clean Room , .

BBackward CurrentPN .(Reverse Current )

Back Flow Effect ( ) .

Back Grind ( ) Wafer , Fab.

Back Plane .

Back PanelFab. Line Bay Room PVC Back Panel . , Particle Room .

Back Seal Oxide , Wafer Outdoping Wafer .

Back Side Grind. Wafer Wafer Get tering .

Back Seal MarkingDevice Marking lot Fab. Site lot# Device Marking.

Back-Annotation layout layout ( ) simulation .

Back-Up System , Gas .

BaffleGas control .

BakeWafer Pre-Bake, Hard-Bake, Soft-Bake . 1) Pre-bake : Wafer Resist Wafer 15010 Oven Wafer 2) Hard-bake : Etch Wafer Resist 3) Soft-bake : PhotoResist

Base ArrayASIC Process Gate (2 Input Nand gate or 2 Input Nor gate) userable gat e array LSI .

Base Line Spec process flow .

Base Line FAB

Base Material ()

Basic Dimension () .

Batonnet .

B/B Ratio (Book to Bill Ratio) 3 3 WSTS( ) Da ta . , B/B Ratio .

BC (Buried Contact)POLY1 N+ Active contact POC 13 doping .

BCD TechnologyBipolar, CMOS, DMOS , Bipolar , CMOS digital logic DMOS . (BCD system reliability .)

BCG Approach(Boston Consulting Group Approach) , (SBU) 2 , . .

BCR (Bar Cod Reader)Bar Code .

Bean LineSource lon Beam .

Beam Mask Beam , Wafer .

Beam Spectrum , .

Behavioral DescriptionSystem input output computer language . VHDL(very high speed hardware descri-ption language), HDL .

Bench Test Test Pattern Die DC Probing Electric al Paramet-er

Bent Lead () 45 .

Bias. () System error.

BiasTR 0 0 Bias .

Bidirectional Buffer signal voltage level , sense AMP data ext-ernal load driv e Buffer.

Bipolar(electron) (hole) ( Transistor )

Bipolar TR TR NPN Type PNP Type 2 . Emitter, Base, Collector 3 , Base Emitter Collector . Transistor Bipolar IC .

BI-MOS MOS Chip .

BiCMOS (Bipolar-CMOS)Bipolar Transistor CMOS Transistor Chip IC. Bipolar Transistor , CMOS .

Binary Number System (2) 0 1 .

B/I (Burn-in)

( 83, 63 ) .

Bin . ) Bin 1-, Bin13-, Bin 15-Parameter .

Bin 1 CheckTest .

Bin Grade DownTest Step Good Device speed power .

Bit LineMemory data data data .

Bit MapMemory CheckMemory Data Cell ( Cell )

Bit Mapper , Fail Point Address Fail F/A Tool.

Bit Fail Device Test Random Address Cell Fail .

Black & White SPOT , pinhole seak .

Black Hole F/A Contact Contact Pattern Poly or Metal Pattern Misalign Over Etch Contact Overap Contact Edge Chemical Contact Defect.

Black Stripe SM

BladeWafer .

Bleeding () . .

Blister .

Block FactorsBlock. Block Block Block .

Blow Hole (Solder).

BN WaferBoron Wafer Boron Wafer Wafer.

BN BN Wafer Tube 375 N2 .

Boat Wafer SiC Wafer .

Boat HolderBoat Poly-Si .

Bonding wire bonding Chip PAD .

Bond Diode

Bonding Layor ()

Bonding Pad

Chip wire bonding .

Bond Strength () .

Bottom Up Design Primitive Cell Circuit Level, Logic Level, Architechure L evel IC .

BoulderFAB Diffusion .

Bow () Wafer Wafer film

BPSGBoron Phosphorus Silicate Glass flow (850 Vis-cosity ) . Oxide Film B,P .

BPT (Bond Pull Test) bondability GRAM weight gauge ball stitch bond .

Bread BoardIC IC IC

Break-DownPN Breakdown . , avalanche br eakdown zener breakdown .

Breakdown VoltageP-N Diode Breakd own .

Break-UpHalf Cutting Wafer Full Cutting .

Bridging .

Broken () Wafer Quartzware .

BT Stress (Bias & Temperature Stress) Bias() Stress .

BT Test (Bias and Temperature Test)TR, Diode Bias .

Bubbler (D-I Water) Wafer .

Bubbler Memory, .

Buffer .

Buried LayerTransistorCollector Collector .

Buried Via Hole

Burr. Trim Lead .

Burn in (85 ~ 125) Device Stress Test , IC (Reliability) , Pa rameter Over Stress Test.

Burner .

BurntBurn-in Device Stress High Current Device Device .

BVcob (Collector-Base Breakdown Voltage with Emitter Open) Open - , Collector Base Breakdown .

BVcer (Collector-Base Breakdown Voltage with Specified Resistance) - .

BVces (Collector-Emitter Breakdown Voltage with Emitter Short-Circuited to base)- Short - .

BVcev (Collector-Emitter Voltage with Specified Reverse Voltage Between Emitter And base)- - .

BVebo (Emitter-Base Breakdown Voltage with Collector Open)Collector open -

CCache DRAMCache ( data buffer ) SRAM Regist DRAM , DRAM SRAM . Main Memory CPU .

CAD(Computer Aided Design) ( ). IC, LSI LSI computer , Simulation, , Device , , , Mask Pattern, Test Pattern Step CAD . .

CAD Software CAD Program .

CAE(computer aided engineering)CAD System ( (Simulation) Tools). CAD , CAD Computer CAE simulation , CAE CADCAM En gineering .

CAM(Computer Aided Manufacturing) , CAD system NC(Numerical Control: ) . Computer LSI LSI , CAM . CAD Master data test data Process data . CAD CAM Computer s ystem CAD/CAM .

Capacitance .

Capatiance Voltage CharacterisMOS . , , , MOS , silicon , , .

Capacitor ()

CapillaryWire Bonding Chip Lead Frame Load Wire .

Capture Center .

Carrier (, )

CarrierWafer 25 . (Blue Carrier), (Black Carrier), (White Carrier), (Metal Carrier) . 1) Blue Carrier : Poly Propylene , 2) White Carrier : Teflon , .

Carrier Generation carrier . Valence Electron Conduction Band Electron Hole Carrier Generation.

Carrier HandlerWafer .

CartWafer strage box .

Cascade3 (DIW) Wafer .

CAT(Category)Bin .

Cavity PKG PKG .

Cavitation pump , , .

CBIC (Cell Based IC)MASK CAD S/W Library .

CBR (CAS Before RAS)RAS Low CAS Low Refresh .

CC (LIM Central Controller)STC stocker cassette .

C&C (Computer and Communications) .

CCD (Charge Coupled Device)(). .

( ) 2 . ( ) .

CCM(Cell Control Manager)Factory Automation System Host Level program() .

CCST (Constant Current Stress Time)Dielectric Film Life Time TDDB(Time Dependent Dielectric Breakdown) . CCST 100 Plate Poly Dielectric Film Breakdown .

CD (Critical Dimension) . 1) ADI(After Develop Inspection) : Wafer . 2) ACI(After Clean Inspection) : Wafer Strip .

CD-ROM (Compact Disk Read Only Memory)CD() Disk.

CDI (Collector Diffusion Isolation) IC .

CellRAM ROM IC Transistor, Capacitor, Resistor 1Bit .

Cell Boundaries. . data .

Cell Deviations(d) , , A data . A Xm . . Xm=A d=0. A "+", A "-" .

Cell GAPLCD , .

Cell IMPMask ROM Bit Implant . P-Well Boron TR compe nsate .

Cell Interval(i) (). .

Cell Library function primitive cellNAND, NOR, XOR Cell Logic sy-mbol, Electrical dat a Layout .

Cell Midpoint(Xm) , . .

Ceramic .

Cer-DIP(Ceramic Dual In-Line Package) Ceramic Lead PKG.

Certification .

Centeral Line. .

Chance Cause(Random Causes), , , .

Chance Variation (Random Variation) .

ChannelMOS Transistor Gate . P-Channel, N-Channel .

Characterization Testing , . Test Time Data .

Charge

Charge Coupled Device(CCD) .

Chip ( 0.5~ 10mm) (Die ). , , .

Chip Select LSI LSI .

Chip-SetSystem component(TTL, Contro-ller, PLL) Chip . chipset system solution software .

Chiral .

Chiral Nematic Phase . cholestric .

Chiral Pitch . .

Chokralsky MethodChokralsky .

Chromaticity() , , 3 , .

Chrome MaskMask chrome() Mask.

Chuck , Wafer Test Wafer Prober .

Chuck Table Wafer .( )

CIM(Computer Integrated Manufacturing) , , . , , , Computer .

Clad (Base Material) .

Clamp Pressure , .

Clean Class () Particle . 1M DRAM 0.1 m Particle . 0.5 m Particle .

CleaningWafer Carrier (D.I Water) .

Clean Paper .

Clean Room() , Particle .

Clearance Hole Hole.

Clinched Lead .

Clock Pulse 1 AND Clock Pulse .

Cluster .

.

C-MOS(Complementary Metal Oxide Semiconductor) N Channel, P Channel MOS Transistor Noise Margin .

CMOS Logic TTL CMOS Logic IC Family, Family NAND NOR Gate, Filp -Flop , Bipolar Logic IC CMOS Logic .

MOSClocked CMOS, CMOS.

C-MOS LOT .

CMS(Central Monitoring System) .

Coating, Wafer ().

COB(Chip on Board)PCB Board Die .

Cob(Collector Capacitance) Collector-Base PN .

BubblerWafer .

Co-ProcessorMain processor instruction . Main processor , floating-p oint math-co-processor, graphic graphic coprocessor .

CODEC (Coder and Decodr)ADC DAC one chip IC.

COG (Chip On Glass) , , .

Cold Solder Joint .

Cold Test (-18 )

Collector Transistor .

ColletChip Lead Fram Expanding Tape Chip Lead Frame .

Column , .

Column Fail Device Test Y Address, X Address Cell Fail .

Combinational Circuit () NAND, NOR Digital

Common .(Ground)

Comparator , TTL Logic IC .

Complementary Circuit ( ) TR .

Compound .

Compound Semiconductor .

Component () . .

Component Density ( ) .

Component Pin ) .

Component Side () .

Compound Device. 2 .

Compressor .

Computer Network . 1 .

Condenser() 2 .

Conductance . Y Y-G-jB G . .

Conduction Band () , .

Conductivity ( ) .

Conductor () ( 10E 6 ~ 4cm )

Conductor Side () .

Conductor Spacing () .

Contact (TEST) Continuity Test , tester interface device . Test IC pin protection diode .

Contact Potentia () .

Contrast Ratio . .

Concuctor Width () .

Conformal Coating .

Confounding, block () .

Connector Area () .

Console () .

Contact ResistenceMetal Wafer .

Contact Spacing () .

Contact SpikingAI P/N Alloy Junction Junction Spike Alloy .

Contamination.

Control Chart .

Control Chart-Standard given .

Control Gate2 Polysilicon Stacked Structure Non-Valatile Momory Gate , Electrode Bias Program Erase .

Control Limit. data

Continuous Sampling Plan Sampling. , sampling sampling .

Conventional MemoryDOS Memory 640KB Base Memory . Expan ded Memory Extended Memory .

Converter . .

Cooker Test TR, Diode, IC .

Coplanar Structure .

CoreEmbedded IC Micro-Operation ALU CPU Block (Peripherals) Core .

Correlation .

Corrosion() AL Etchant Gas Al2O2 Metal

Cosmetic Appearance() A Instrum ent panel , E (car -audio), B Game .

Convalent Bond() . .

Cooling Wafer (CW)

CPO (Customer Product Operation) Device Test Customer Special Spec .

CPU (Central Processing Unit)Computer , .

CPU CoreLSI Microprocessmicrocon- troller, standard cell SOG Gate Array

library , user system ASIC Micon 1chip

Crack. , stress Chip, PKG .

CradleChip Mount , .

Crazing .

Critical EnergyIon Beam Energy mask Implant Energy .

Cross Section() Layer Pattern Layer .

Cross Talk .

Cross-overIC .

Crow FeetWafer .

Crystal Osillator .

CTN(Complementary TN) LCD

CUM Graph(Cumulative Graph) data data data . Water die data Die (element) Data (Wafer) .

Cumulative Frequency Distribution . .

Cure, PKG .

Custom IC. IC.

Customer LayerASIC process gate array base array process user gate process .

CUT-OFF Frequency .

Cut Stroke .

CV(Cleaning Vacuum) .

CV(Count Variance).

CVD (Chemical Vaper Desposition)APCVD, LPCVD Wafer Poly Nitride, PSG, BPSG, LTO .

C-V Plot (Capacitance Versus Voltage Plot)Wafer , (, , , ) .

CVST (Constant Voltage Stress Time) .

CycleFunction Test Device .

Cycle Time

.

CRT(Cathode-Ray Tube) .

Cryo-Pump Gas .

CQ(Conditional Qualification) .

CTE(Coefficient of Thermal Expansion) .

CTM(Clean Tunnel Module) Hepa Filter Clean Room A Class . 0.3m/s 700/h. Granting Down Flow Clean , Hepa Box .

CTS(Computerized Typesetting System) , .

CU(Control Unit)Timing. .

Culvert, .

DD(Demerit)Quality score . D-A (Digital to Analog Converter) Analog .

DA(Die Attach)

Die Lead Frame

DAC(Digitaaal to Analog Converter)Digital Analog . Hi-Fi CD player 16bit D/A convertor .

D.C CharacteristicDeviceStatus Current , Device Status .

DAD(Digital Audio Disk) Disk .

DAE(Dynamics Asian Economies), , , .

Daisy Chain LSI

DambarPKG Lead Bar.

Dark Current() .

D.A.T.A Derivation And Tabulation Associates Inc. .

Data Line on-off .

Data Retention Mode (DRAM/SRAM) power-off battery back-up circuit

DC(direct Current) .

DC CharacteristicDevice Status current , DeviceStatus .

DC Parametic TestingSteady state test OHM . / / . DC test (ICC), (leakage test), (VIL,VIH), (VOL,VOH) .

DC PDP (Direct Current Plasma Display Panel) (lonized Neon-Argon Gas , .

DCW (Dry Cooling Water)FAB Cooling Coal .

DD (Double Die) Die.

Debug, . Debugging, Screening, BURN-IN .

DebuggingTest Plan .

Decay Time 100% 10% .

Decel Mode lon ( 0-33kev)

Decoder2 (Decode) (10 ) 2-10 Decoder . Encoder

Defect () product service . defect . 1) Class 1 : . 2) Class 2 : . 3) Class 3 : . 4) Class 4 : .

Deflash

Compound .

Defocus ( ) (P/R) .

Delamiantion () .

Delay TimeTR Switching () 10% .

Demo Wafer .

Demutiplexer data () control .

Dent .

Depletion DeviceMOS FET Gate Channel .

Depletion Layer() PN P HoleN . .

Depletion Mode TR Bias .

Depletion TypeChanneldeplete . channel .

Deposition CVD , Si Film() (Oxide, Nitride) .

Deprocess strip back defect site .

Descum (scum) .

Design KitElectrical/Physical ASIC modeling layout database Electricla Design Kit . (: Mentor Design Kit, Verilog Design Kit)

Design Rule .

DevelopMask Align expose Pattern .

Development. Pattern .

Device()()

Dextrotatory () .

Dewetting .

DF (Die Fabrication)Wafer mount dicing saw .

Dichronmated Gelatin Dichomated gelatin .

Dicing Wafer ( )

Dicing SawWafer Die (Chip) diamond wheel.

Die Attach Die Lead Frame .

Die BusinessProbe Test package Good Die wafer wafer Good Die .

Die Bonder (chip) , IC .

Die BondingIC Chip . , .

Die CoatingDie .

Die ColletDie Die . .

Die Pocket Die . .

Die SawingWafer chip .

Dielectric Constant() .

Dieletric Isolation

IC Electrical . (), Poly -Si, Ce -ramic .

Diffused Resistor diffusion .

Diffusion (Wafer) B (boron;) P(Phosporous;) .

Diffusion CapacitanceDiffusion Junction Capacitor .

Diffusion Current E-filed/ Current Carrier .

Diffusion Furnace

Diffusion LengthCarrier Carrier Carrier . Life Time Carrier diffusion length .

Diffusion Pump gas .

Diffusivity .

Digital(DIC)Analog "1" "0" (Digital IC)

Digital IC "1" "0" digital IC, MOS IC Bipolar digital I C , logic IC Memory IC . ,, .

DigitizingMask .

Dimenrization() .

Dimension

DIMM(Dual In-Line Memory Module)PC Memory module PCB pin .

DimpleWafer .

Dimentional Stability( ) , , , .

Dimentioned Hole () .

DINDeionized Water .

Diodedi-electrode 2 . 2 , , .

Diode Array .

Diode Ring Structure .

DIP(Dual Inline Package) IC , (Chip) .

DiscolorWafer FAB Pad .

Discrete(IC) . TR, Diode, , Discrete .

Discretional Array MethodLSI 10 100 (Cell Unit Cell ) Cell .

Discrete Device , Transistor , Diode .

Discrete Product Diode, Transistor, (Rectifier), (Thyristor) , .

Discretion Wiring-ApproachWafer , Wafer Patt ern LSI .

Display Device, .

DIW (Deionized Wafer) , Wet .

D-I Water (De Ionized Water Semiconductor grede Water) , Wafer .

DLM2 Metal Layer . 1 power routing line 2 rounting line .

D-MOS(Double DiffusionMetal Oxide Semiconductor) channel length , MO S .

DMA (Direct Memory Access) CPU data

DMAC(8237A) DM A data .

Domain cell .

Donor N-type P, As, Sb .

Donor level N donor . (Forebidden band) level Donor Level .

Dope (, ION IMP-LANTATION ) .

DopantDope .

Doping (Wafer) P-type N-type .

Dope OxideDoping layer Oxide.

Dosage .

Doselon lmplantation dose , .

Dot-Clock Signal .

DPLL(Dull Phase Locked Loop)PLL 2 PLL PLL DPLL , Digital PLL .

DRAM(Dynamic Random Access Memory)Capacitor Cell device CAP Charge Refresh Cycl e . Refresh RAM (capacitor) , Memory leak , Refresh . DRAM SRAM memory cell memory .

Drain TR(FET) , . TR, TR .

DRC/ERC/LVS DVP-Circuit Layout Design Rule, . 1) DRC(Design Rule Check) ; Layout Data (Metal , ) Check 2) ERC(Electrical Rule Check) ; Check. 3) LVS(Layout vs Schematic) ; Layout Data Circuit .

DressingWafer (Blade) Dressing .

Drift "0" .

Drift Current Extrinsic Semiconductor E-Filed Current Carrier Drift Velocity v= E ( :M oblity, E:Electric Filed) .

Drive-InDeposition B() P()DMF wafer (Furnace) .

DriverDevice , .

Driving Fregurncy .

Driving Voitage

.

DRO(Destructive Read-Out). .

Dross() .

DRT(Device Reliability Test)" " (Quality Approval Test) .

Dry Etch , Gas(Plasma) .

Dry Process TR, IC beam .

DST(Die Share Test)Die Die Attach Die Frame pad .

DT(Down Time) .

Dummy WaferTube Uniformity Wafer Wafer Wafer Wafer

Dumping-ZIG Carrier wafer carrier .

DUT(Device Under Test) . test , DUT Board .

Duty Cycle refresh rate 60Hz .

Duty Ratio .

Dyed Polyimides (polyimide) .

Dynamic Shift RegisterMOS Shif Register .

Dynamic RAM(Dynamic Random Access Memory; DRAM) "1" "0" .

Dynamic Scatting Mode ( ) . . .

DynascopeWafer 0.1mm . ( ) , , .

DW(Diffused Wafer)

EE/Post SimulationSimulation layout esti-mated wire capacitance Pre Simulation la yout actual wire capacitance Post Simu-lation .

EA (Exhaust Air) GAS , , , , , .

EAROM (Electrically Alterable ROM)EPROM .

EBE (Electron-Beam Evaporation)

Beam Wafer() .

EBR (Edge Bead Removal)Wafer particle .

ECC (Error Check & Correction)ROM device repair column row program RAM Redency . logic column row fail column row . MASK ROM DRAM Module .

ECC(Error Correction Code)(Error Checking Code) , .

ECC Mode (Error Catch & Correction Mode)Memory Module Parity Bit 2Bit Error Memory Module .

ECL (Emitter Coupled Logic)CML(Current Moded Logic) . Bipolar Transistor ( ) . Transistor Emitter Emitter Coupled Logic .

Edge Board Connector .

Edge Board Connector .

Edge Definition () film .

E/D MOS (Enhancement-Depletion MOS)Enhancement MOS Depletion MOS .

ED (Electronic Data Interchange) EditingCAD System CRT Layout

.

EDO (Extened Data Output)DRAM data access fast page mode /CAS signal inactive high valid data /CAS signal low active data . fast PAGE MODE TPC(fast page mode cycle) speed . .

EDS Wafer .

EDS TestWafer (chip) .

EDS YieldEDS test : (Good Die / Net Die)100

EECA(European Electronic Component Manufactures Association) .

E-E PROM(Electrically-Erasable PROM) off data . Parallel data Intel Type Seria l data NEC Type . Tunneling Erase Programming In-System 2 Transistor 1 cell EPROM .

Elght Nines9 8 . 99.999999% .

Effective Channel LengthMOS Source Drain cha-nnel Gate length . EL ()(ELECTRO-LUMINECENCE) . 1936 DESTRIAU 2 .

ELD (Electro Luminescent Display)PDP COLOR .

ELD .

Electroless Deposition ( ) .

Electrical TestProcess Wafer Passivation Test Pattern Test Test (, wafer mapping)

Electron Beam Exposure System Beam mask pattern system, mask pattern pattern pattern generator , , . LSI pattern data algorithm , EBMT( tape) Beam on/off, aperture pattern . ASIC sample needs . mask wafer Beam .

Element () .

EllipsometerThin Film (Polarization) .

Electron Beam Exposure ( ) ( ) photolithography .

EM (Electromigration) Metal Quality .

EmitterNPN,PNP Transistor .

EMM(Emission Microscope Multilayer Inspection) Electron Hole recombination photon leakage current FA .

Emulsion MaskMask , Emulsion() Mask.

EncoderDecoder . (10 2 )

End Point DetectionEtch Wafer plasma Etch stop reference .

End SealLCD

End Stationlon wafer .

Endurancedata program erase .

Energy Band Energy .

Energy Gap energy gapdlfkrh .

Energy Level . . .

Enhancement DeviceGate Channel MOSFET.

Enhancement Mode TR (FET) Gate bias .

Entity () .

EOH (Ending on Hand) ( ).

EOP (End Of Point) plasma .

EOTC(European Organization on Testing and Certification)

EPD (Etch Pit Density) Etch Pit . End Point Detect Etch Etch Etch .

Epi (Epitaxial Layer) . Bipolar Transistor Epitaxial Layer .

EpitaxialEPI-TAXIAL " " . Substrate Substrate .

Epitaxial-Growth () Substrate .

EPM (Electric Parameter Monitor) test pattern , .

EPM Standard Sub Program EPM .

EpoxyChip lead frame .

Epoxy Dispenser Epoxy

EPROM(Erasable Programmable Read Only Memory) ROM . programm- able ROM, Program IC Package glass . bit .

EPS(Experimental Plan Sheet)S/N RUN SPLIT

Equip(Equipment).

EraseEPROM EEPRO Floating Gate Tunneling Bit . EPROM Floating Gata discharge EEPROM Floating Gate .

Erase GateErase Gate 3Polysilicon Split Gate Flash E(E)PROM Erase Gate Electrode.

ERC(Electrical Rule Check) check .

ERC(Electrical Rule Check)Layout , .

ESD(Electro Static Discharge)

ET Part(Extended Temperature Part) Memory Device 0 ~ 70 Device 40 ~ 85 .

Etch Back , .

Etch BiasPhoto etch pattern .

Etching. Silicon wafer chemical gas .

Etching Selectivity( ) SX

(plasma) .

Etch Factor .

Etch Rate. A/min .

E-Test (Electrical Test)Process Wafer Passivation Test Pattern Test Test.

EvaporationWafer AI, Au() .

Evaporatorbeam wafer .

EventEvtity Start, End, Maintenance .

Evolutionary Operation(EVOP). .

EWS(Engineering Work Station) CAD Design Tool system system.

Excess Electron () .

Excite () . pumping .

Exclusive Effect 2 . . , .

Exclusive or Circuit "1"', "0" "1" .

Exoending TapeWafer 360 tape.

Expose() P/R wafer pattern aligner .

External Visual Inspection .

Exposure, WF mask . mask p attern .

Extraction VoltageLon Source lon Beam .

Extrinsic Semiconductor(lntrinsic Semiconductor) (3, 5 )

Eylet .

FFAB (Fablication)Wafer .

FAB Process Wafer diffusion, thin film, photo, etch .

Factor, .

Fail Memory Device Function Test Device Device

Falg . . tag .

Fail Time() TR off collector on 90% 10% .

Fan coil unitcoil .

Fan Out CapabilityDevice data current drive .

Fan-In .

Fan-Out .

Farad . 1F 1 volt/sec 1A .

Fault CoverageSimulation simulation vector % access output simulation vector .

FCU (Fan Coil Unit), .

FDM (function data module) (function data) module.

Fermi Energy

energy energy . energy - . 1/2 F .

FET ( Transistor:Field Effect Transistor) carrier ( ) Transistor. carrier Bipolar Unipola() Transistor .

FFU () Fan Filter Unit

. fan filter filter fan clean

Field oxideactive active .

FIL (Filament) .

Fill Factor

Filter ()

Final test (/Class Test) .

Finder CoatWafer .

Fire Damper (F.D) Duct damper 70 fuse damper.

Film Ware software ROM .

First Acticle ()

.

First MinimumGooch & Terry 0 .

Fixture .

Fixed Oxide Charge (Qf)Oxidation , , Cooling silicon Oxide charge.

Flat PackIC .

Flat-Zone Alignercarrier loading wafer(flat-zone) .

Flash EEPROM EPROM EEPROM EPROM EEPROM , EPROM, EPROM . Memory Device block . flash memory NOR, NAND NOR EEPROM Hot Electron , NAND . . Memory har d disk .

Flat Zone ( ) Wafer cut .

FLC . . .

Flexible Strength,

Flip-Flop2 (on off) .

Flicker

.

Floating GataMOS TR Floating Gate .

Floor plan chip layout block layout layout block .

Flux .

Forbidden Band () . .

Forming DieForming I.C. ead frame lead frame .

Forming Gas1) Die Attach wire bonding H2 N2 Gas. 2) FAB(, ) Gas.

Forward () PN P +, N .

Forward Current ( ) PN .

Forward Voltage ( ) PN PN .

Four Layer Diode (4 Diode) PNPN 4 Diode.

Four-Point Probe sheet .

FOX (Fast Oxidation)(0~25) Hipox . (High Pressure oxida tion)

FPGA (Filed Programmable Gate Array) program chip CAD .

FPO (Finish Process Order) lot lot 1 lot flow , lot FPO lot . .

FQ (Full Qualification)Customer .

FR (Failure Rate)" " .

FRAM (Ferroelectric RAM) . , memory cell RAM SRAM DRAM data . EEPROM data .

FrameReticle/mask Alignment PatternProcess item Sawing Scribe line Alig nment . Scibe li ne Align key Process inspection Pattern .

Frame RingWafer tape .

Free Election ()

Freon

.

Freedericks () . Hc .

From/To chatInter-bay intra-bay simulation chart.

FSTN(Film Super Twist Nematic)DSTN . FSTN DSTN .

FTA (Fixed To Attempt Ratio) Wafer repairable fuse cutting .

Full-Auto host AGV CST LOAD/UNLOAD .

Full Custom Tool Chip IC. MOS tran -sistor level . Simulation, opti -mization Chip Area layout .

Full Cutting, (tape cutting) Wafer (95~100%) .

Function Test.Device Formater Device .

F.W.W(Flouric Waste Water) .

G

GaAs(Gallium Arsenide) , silicon . III-V Si 5~6 , device . UHF SHF GaAs FET, micro anlog IC, Diode, laser, .

Gas Scrubber gas .

Gate transistor , 2 MOS transistor bipolar transistor base .

Gate Array NOT-Gate, AND-Gate, OR-Gate, NOR-Gate, NAND-Gate Transistor logic . semi-custom digital IC. cell master wafer user Timing Chart Data CAD . Gate Type Chip Gate Gate SOG(Sea o f Gate) G/A .

Gate oxideTR 2 , insulator , MOS TRGate

Gel .

Gettering , , Si-SiO2 .

GIDL (Gate Induced Drain Leakage) Gate oxide breakdown voltage drain substrate leakage current gate drain field drain deep depletion band , ba nd tunneling drain junction inpact ionization EHP drain hole substra te leakage current .

Glass Substrate . .

Gm (Transconduction)Gate Source Drain . = Bipolar TR ()

GN2 (General N2) N2. Purge .

GO/NO GO TEST (pass) (fail) (GO), (NO-GO) . Wafer Die Package Device / Test . Test Program Program.

GOI (Gate Oxide Integrity)Gate Oxide . (BV,) . GOI System In-Line Diffusion Oxidation Tube, Recipe, W/S Electrical Stress Test .

Grade JunctionPN P N . P N P N .

GratingClean Down Flow Lamimar Unit floor . Ac cess Floor . . Aluminum . .

Grain () .

Ground Gate ( ) TR(FET) 3 Gate (Common Gate) . .

Guard RingPNPTR P N , P

. P . BAND GUARD .

Guard RingsCMOS Latch-up Pattern Ring .

Guest-Host Effect . . , .

HH.A.L(Host Solder Air Leveling)P.C.B .

HandlerPackage Ttest Test system(Tester) .

Half CuttingWafer 70 ~ 80 % .

Halide 2 . .

Hard Fail defect .

HCT (High Speed C-MOS TTL) C-MOS TTL LSTTL ( ) Com-puter computer CPU, Menory, IC .

Heat Sink Plane () .

HEMT (High Electron Mobility Transistor) Transistor , GaAs , FET GaAs undoped GaAs, N AIGaAs , AIGaAs Channel .

Hepa BoxClean Room Hepa Filter Box.

HEPA Filter (High Efficiency Particulate Air Filter)Clean Room Filter . (0.1 m - 99.9995 %)

Hetero Junction P N PN Junction . P N . 2 HETERO Juction .

High Power InspectionWafer Die

Hfe(DC Current Gain)Emitter .

HierarchyLSI Design Design .

High Pressure Cleaner Wafer CO2 D-I Water .

Hillock .

HMDS(Hexa Methyl Di Silazane ) Wafer Wafer Primer( ) .

H-MOS(High-performance MOS) MOS IC N-NOS MOS.

Hold Time data tCAH(Column Address Hold Time) tRAH(Row Addres s Hold Time), tDH (Data Hold Tome) .

Hole. .

HOPL(High Temperature Operating Life Test)" " 125 Oven 7.5(V) Bias, 1000 " " .

Hot DI water DI water(85), Wafer .

Hot RunRUN(lot) RUN . Normal RUN RUN.

Hot Test Test .

Hot Electron . ( ) . . Hot Electron .

HP4145Wafer level DC Graphic Bench Test T ool.

H/S (Heat Sink). PKG .

HTO (High Temperature Oxidation). . (900) Si Wafer , Si Wafer SIO2 .

HTRB (High Temperature Reverse Biase)

" Bias" Device Bias Oven .

HTS (High Temperature Storage)" " (125) Oven Device .

HVAC (Heating Ventilation and Air Conditioning) , () .

Hybrid-Circuit , , .

Hybrid I.C (THIN FILM) (THICK FILM) I.C , I.C . IC ,, , .

II-line stepper 365 nm

IC (Integrated Circuit) 2 , , .

IC Memory TR MOS F-F Memory(cell) IC.

IC Tester ( ) IC . ATE (Automatic Test Equipment) .

IdsMOS TR Source Drain .

Ie (Emitter Current)

IEC (Integrated Equipment Computer)

. (Integrated Injection Logic) Bipolar Transistor PNP Tr-ansistor NPN Transistor . Bipolar Logic IC . PNP Transistor NPN Transistor N P . Gate . Analog. Digital Bipolar IC Digital . (Isoplanar Integrated Injection Logic) .

ILT (Infant Life Test) () 48. Burn-In .

Image Sticking() ghost .

Impact Ionization Electric Field Electron Atom Electronhole Pair .

Implanter( ) wafer , , 3 .

Implanting () wafer B() P() Implanter .

Impurity , P N . P: B, AI, Ga, In N: P, As, Sb

Index Feeding Lead Frame .

Index Register Address Register.

Induced Cholesteric Phase . .

Induced Smectic Phase , .

Indum arsenideInAs, III-V .

Initial OxideSi Nitride Tensite Stress(1109 Dyne/cm2) , Buffered Oxide . , Oxide Bird's Beak .

Injection() PN .

Ink .

InkerWafer Ink .

InkingPackage Package Wafer Inking .

Inorganic Filter .

Input Buffer Signal voltage level .

Input LevelDevice De-vice (High, Low) .

Insulator .

Inter-bayBay Bay Clean Way (AGV, Track) .

InterfaceAmp Computer . Inter Metallic Compound( ) .

Intra-bayBay AGV Track .

IntrinsicP N , P N .

InversionMOS FET Gate PN Type NP Type .

Inversion Wall() . , .

Inverted Staggered() source .

InverterDigital Circuit 10 01 .

Ion Beam Lithography Optic, X-ray, electron beam Lithography . Ion Implantation .

Ion InjectionSilicon lon .

Ion Shell () .

IPA (Iso Propy Alcohol) .

IPO (Inter Poly Oxide) Poly Si Poly Si Oxide.

ISO-PlanarPlanar .

Isolation Chip TR, Diode Isolation .

Isolation Diffusion N Epi P Sub-strate . Epi .

Isotropic Etching . () .

Isotrophic Phase () . ..

Isolation in IC .

Isotropic

ITO(Indium Tin Oxide)

. (In2O3, SnO2) .

JJ-FET(Junction FET)Depletion Mode Source-Drain lon Gate Gate Drain FET(Filed Effect Transistor) .

Jig .

Junction . Junction Depth (Xj) Silicon Diffused layer background .

Junction DiodePN Diode

Junction Transistor ( TR) 3 ( PNP NPN) TR.

Junction SpikingMetal-Silicon contact Metal Silicon

Jungle-Box Gas Gas Flow Meter(MFC) GAS .

KKerf(). Blade .

Keying Slot .

LLabelling() Wafer RUN Tube Diamond pen .

Laminar Flow Station Filter .

Laser Diode PN . PN .

Laser Interference MethodEtch Wafer Laser .

Laser Repair Data ( ) laser data( ) .

Laser Scriber Wafer Die .

Laser TestYield Fuse Laser

Lasera .

Latch

Latch UpCMOS , ionizing redation Turn on .

Layer IC Si-Wafer (Insulator, Conductor) Photo/Etch Pattern .

Layout PlotLayout Hard Copy C-MOS LSI THYRISTOR TRANSISTOR IC .

L/B (Loadboard)Test System Jig.

LC (Liquid Crystal) . . " ".

LCD(Liquid Crystal Display) .

LDD(Lightly Doped Drain)Doping , Device .

LDMOS(Lateral Diffused MOS) MOSFET Source Drain .

Lead Finshing Lead (Tin), .

Lead FrameTR, Diode, IC Sawing Die Attach . Alloy42 , Copper, Kovar, Steel IDF TTT .

Leak Pin Pin .

Leak Current .

Leakage Input tristated output open circuit high impedence . leakage voltage input triasted output current input leakage triasted leakage .

LED(Light Emission Diode) Diode. (PN )

Legend() .

LF(Lead Frame)Chip .

LibraryGate array Standard cell .

LIM(Linear Induction Motor) 1 , 2 Motor.

Linear IC IC , , .

LIPAS(Line Item Performance Against Schedule) .

Liquid Crystal () .

Liquid Phase Epitaxy () . Ga, Sn .

LN2(Liquified N2) N2 GAS, .

LoaderStocker Station Cassette Unit.

Load CircuitTest Device Application , Cpacitance Circui t.

LoadingWafer Boat Tweezer .

Loading Effect() Pattern Pattern .

Loading fixtureLead Frame .

Local Oxidization of Silicon. silicon silicon silicon silicon .

Logic Circuit() 2 , , , .

Logic SimulationIC Functionality Logic Value .

Logic SynthesisHDL Netlist Logic Level Schemetic . VHDL Logic .

LotSampling .

LotWafer .

Low Power Part Power Device Portable .

LP(Lens Paper)Lens .

LPCVD(Low Pressure CVD) Wafer Deposition Gas .

LRR (Lot Reject Rate)Gate Lot Reject.

LSB (Least Significant Bit) .

LSI (Large Scale Integration) Transistor100 .

LTO (Low Temperature Deposition of Oxide, ) LPCVD 400~450 .

LTS(Low Temperature Storage)" " (-40) Oven Device . Luminerous Effciency .

Luminescence .

LVS (Layout Versus Schematic)Layout .

Lyotropic Nematic , .

MMacro Cell Library Core Macrocell Interface Input/Output Macrocell .

Macro FunctionMacrocell Macrocell Library CAD software Library Library.

Macro Loading EffectWafer etch .

MagazineLead Frame Strip Carrier .

Magneto Diode ( Diode) Diode.

Main Frame . . , , .

Magnetic Ink (, ) Ink, TR IC Wafer .

Majority Carrier ( ) . .

Manual StationHandler Tester .

Mask

. Mask Epitaxial Method Mask .

Mask Layout Mask , , , ,, , , mask .

Mask Tooling InformationReticle/Mask Information PG Data, FramePIE Scrbe Line Align Key Information Vendor .

Master Drawing , , , .

MBE(Molecular Beam Epitaxy) .

MCC(Motor Channel Center)Motor , Panel.

Mcdonnell Switch . Boiler , Gas Boiler .

MCM (Multi Chip Module) . MCM , , .

MDS (Microcontroller Development System)MICOM Program Tool.

Measling .

Mechanical Pump

Gas .

Mega CellRAM,ROM Memory PC 82 Series Logic Macrocell Library.

Mega functionMegacell Library Macrofuntion CAD Library Megafunction Library Disk .

Memory CellMemory IC Data . RAM SRAM, DRAM, SRAM Cell Latch , DRAM Condenser . SRAM , Access . DRAM Condenser Bit ,. . Leak Data Rewrite (Refresh) . Memory Effect .

Memory module Memory Memory .

Mesogen .

Metal Gate (AI ) TR MOS FET MOS FET IC .

Metallization .

MFC(Mass Flow Controller) .

Micro BridgePattern Pattern Bridge Scope Current leve l Scope .

Micro IC

.

Micromulsion () .

Mil 1/1,000 Inch. 25.4 m.

Minority Carrier( ) .

Mis-Align (mask) Wafer .

MLM(Multi-Layer Metal)IC Metal 1 Layer . 2, 3 .

MMIC(Monolithic Microwave Integrated circuit) Wafer IC Inductor, Capacitor,, Transistor .

MO Tape(MASK ORIGINAL TAPE) Mask Data .

Mobility, , , , 10/m . .

MOCVD(Metal-Organic Chemical Vaper Deposition) MOVPE Epi . Source 5 .

Mode. . , , Operation .

Model ParameterSimulation

.

Module .

Module .

Molding () . Wire Bonding () package .

Molding CompoundWire Bonding .

Molding Die .

Monitoring .

Monolithic IC1 .

MOP(Metal Oxide Passivation) .

MOS(Metal Orcide Semiconductor)Silicon Device.

MOS FET(MOS Field Effect Transistor)Source, Drain Gate3 Gate Source Drain Channel .

MOS ICMOS FET IC.

Movement Run .

MPR(Micro Peripheral) LSI Micro Computer Microprocessor LSI .

M-Pyrol , , .

MRB(Material Review Board) Criteria , Stock Shut-down 24 Corrective action .

MSI(Medium Scale Integration)100 10 Transistor .

MTO(Medium Temperature Deposition of Oxide)LPCVD 800 .

Multi-Processing .

Multiple Diode 2 Diode .

Multiplexer () Control .

Myelin FigureA 2 .N

Nail Heading .

Nano Line Intensity .

Nano SpecWafer .

National Reference Standard 2 .

Navigation TFT-LCDLCD , .

N-ChannelP FET , .

Neat Phase , , lame lla .

NeckingInterconnect line .

Negative LCDNormally black .

Negative Resistance .

Nematic IC .

Net DieWafer Total Die.

Netlist Simulation Layout , , , Signal Name File.

Neural Processing Chip Neuron Neuron IC.

N-CH Filed Implant

Filed Region VT Ce Cell Filed Oxide ll ICON .

N MOS(N-channel MOS) P Source Drain N MOS device.

Nodule , Si Si .

Noise Margin( ) 1 0 level "1" "0 " .

Non-Volatile( ) Memory.

Notch/Void () . Notch , Hole Void .

NotchingPhoto line .

Notebook TFT-LCD 3.5Kg PC 10 Laptop Pitch 0.21, 0. 33mm.

NPN TRN ,P, N , , TR.

N-Type Silicon(Negative Type Silicon)Major Carrier Electron .

NVD(Non Visual Defect)Deprocess Fail Defect Non Visual Defect .

OOA(Outside Air)AHU .

OAHU(Out Air Handing Unit) .

Oalemce Election , .

OCD(Optically Coupled Device) .

Octal TestProbe Test touch 8Die Probeinng 8 Die test .

OEIC(Organized design for line & Crew System)System Layout Method Line .

One Chip CPU 1 Chip LSI .

ONO Capacitor Dielectric Material Oxide/ Nitride/ Oxide 3 Pinhole Breakdown , Nitride Dielect ric Constant Oxide Capacitance .

Open .

Open RepairTFT Arrey Panel Data Lline Gate Line line short .

Optic Emission MethodPlasma etch Optic signal

.

Optical Axis (No:ordinary) (Ne:extra ordinary) .

Orientation- Film() . Oscilator( ) .

O/S(Open Short) .

OTP(One Time Programmable) EPROM Device Plastic Package Erase Package Device .

Output BufferSence AMP Data External Load Device Buffer.

Output LevelDevice Data (High, Low) .

OutgassingSource Gas Gas Lon Beam .

OvenWafer .

Over Coat(ITO) Alksli Barrir Coa t .

Over Coating(Polyimide Coating) , .

Over EtchingEnd Ppint Detection Etch .

Oerlay VernierWafer Wafer Pattern .

Over- flow .

Oxidation , (650 ~ 1200 ) Wafer .

Oxide(SiO2)

Oxide BreakdownOxide voltage .

Oxide Film() .

PP-ChannelN P FET , .

P & R(Placement & Rounting)Design Automation Chip Layout Macro-Block Standard-Cell .

P/A(Process Area) Wafer Area.

P-Type Silicon(Positive Type Silicon)Major Carrier Hole Si .

PA(Process Air)Air Comp Dryer Filter Air .

PackageTR, Diode, IC Package Mold() Type, Ceranic type, Cam() type . Type Pin Type .

Package Density .

Panel Plating() .

Parasitic Effect() IC .

Passivation , , Damage Plas ma CVD Oxide Nitride , PN , .

Pattern .

PBH (Planer Buried Heterostructure) (LD) , epi .

PCB (Printed Circuit Board: ) , , , , TR, IC, LSI, .

PCD (Plasma Coupled Device)CCD Device.

PCM DataRUN Data Test pattern Data.

PCM TestProcess control monitor , .

PCT(Pressure Cooker Test)" " 15PSI, =100%, =1212 Pressure Cooker .

PCW(Process Cooling Wafer) .

PD(Photo Detector) PIN-PD, APD .

PDP(Percent Defect Panel) .

PDIP (Plastic Dual In-Line Package)Plastic Package Type Package Lead Socker .

PECVD(Plasma Enhanced Chemical Vapor Deposition) Plasma . TFT-LCD Insulato r a-Si .

Pellet Wafer .

Pelletizecompound .

Performance BoardTest System Test System Probe PCB Coaxial Cable Wiring Interface board.

Peripheral LSITest system CPU LSI.

PG(Pattern Generator)CAD System Digitizing Mask Pattern Reticle .

PG(Pattern Generation) Pattern Layout Reticle/Mask Data

.

PG Tape Layout Data Reticle/Mask E-Beam Machine Format Data PG data Tape .

PGA(Pin Grid Array)LeadPackage .

Phase() 1 .

Photo Conductive Effect() .

Photo Diode PN PN .

Photo Etching( ) .

Photo-Resist Positive Negativ e 2 .

Photo-Resist or Resist Positive Negative .

Photo Volatic Effect( ) PN PN .

PI(Process Integration) Photo, Etch, Diffusion, Thin Film, Ion Implantation Process Flow .

Piezo Electric Effect() .

Pin Hole Mask WF Pattern . .

Pit .

Pixel() "Picture Element" R,G,B 3 1 .

Pixel DefectLCD .

PLA(Programmable Logic Array) Program .

Planner. FAB Silicon .

Planar TransistorFAB Silicon Chip .

Plasma .

Plasma Display .

Plasma Etching Gas Energy , , , , , .

Plating.

PLCC(Plastic Leaded Chip Carrier)Package lead 4 .

Plenum .

PLL(Phase Locked Loop) .

P-MOS Channel MOS Transistor.

P-N JunctionP-N Junction P N . Junction (rectifier) Diode .

PNPN DiodePNPN 4 Diode.

PNP Type TransistorPNP P, N, P , , TR .

Polarizer , 2 PVA TAC(Tri Acetyl Cellul ose) .

Poly-Crystal() . Poly-Crystal Silicon( ) . .

Poly-Si , . .

Polyimide

Rubbing .

Polymer. (Monomer) .

Positive LCDLCD Normally White .

Post Burn-inBurn-in .

Post Laser Repair TestLaser Repair Wafer Chip Pass/Fail Laser Repair .

Pot .

Power RegulatorBipolar IC IC Linear IC .

PR(Photo Resist) Pattern . Pattern . Pre Burn-in Burn-in .

Predipitate ( ), FAB .

Preform Feeder Preform Lead Frame .

Pretilt Angle .

Probe CardWafer Chip Probe Tip .

ProberTest Wafer X, Y, Z ROOM/HOT Wafer Point Test .

Probing PAD Probe Tip Contact .

Process Minispec. base line FAB SPEC ,, .

Profile .

Proximity EffectPattern Etch .

PRT(Production Realiability Test) .

PSG(Phospho-Silicate-Glass) . Phosphorous Reflow .

P/S(Prober Station)Wafer

PSRAM(pseudo SRAM)DRAM SRAM Refresh DRAM SRAM .

P-TypeN-Type 3 .

P type semiconductor .

Punch-Through Breakdown

Source/Drain Junction depletion region Breakdown Substrate , Short Channel Junction Depletion Source -Dain .

PV(Process Vacuum) Pump . .

PVD(Physical Vapour Deposition)CVD , .

PW(Polished Wafer) .

PWL(Pulsed Word Line)ICC Reading Word Line Signal Pulse Control Circuit .

QQDR(Quick Drain Rinse)DI Rinse Cycle Sho-wer Drain Cleaning .

QFP(Quad Flat Package)Lead Package Lead .

Quartz BoatWafer , .

Quartzware() Furnace N/C Chamber .

Q-tip. Cleaning .

QTL(Q8K Test Language)Q8K Test System PGM language.

Qual(qualification) Test .

Quantum Electrnics Elec tronics .

QV (Quality Validation) Test QA , ,Test .

RR/A(Return Air) .

Rack. .

Ram Height .

Rambus DRAMRambus DRAM. Data 500MHz data bus .

RAMDACPixel Address RAM DAC R.G.B Analog Chip.

RasterCRT .

Recipe Material Process Rule Control data .

Rectifier Diode .

Recombination , .

.

Rectifying Action() .

Redundancy Cell Chip .

Redundancy Chip Cell Defect Cell Cell .

Reference Check Device System Check .

Reflectance() Film .

Reflective DisplayBacklight Display.

RefreshDRAM MOS FET WRITE-IN REFRESH .

Reject Wafer Mask .

Reliability .

RepairableMemory Chip Fall Bit Redundancy Fail Cell Spare Cell Repairable . Wafer Test Row Column Cell Row Column .

Repeating Defect() Wafer .

Resin Recession .

Resisstor Retilcle Mask Chip 10 Mask Master Mask .

Resistration .

Response time .

RetestSystem Align Test Wafer Test .

ReticleMask .(Stepper Mask) Wafer Pattern ( ) () Wafer .

Reverse Tilt .

Reverse Twist , .

RF(Radio Frequency) , Gas , .

RIE(Reactive lon Etching) . Plasma etching Ion .

Ring OscillatorLibrary .

Rinse(DI Water) Wafer .

Rise Time() TR Collector ( ) 10% 90% .

Room Temperature Test .

ROR(Ras Only Refresh)RAS Low Refresh .

Round CutWafer Wafer .

RoutingPCB . PCB Drill PCB .

Row Fail Device Test X address, Y address cell fail .

R.S(Resistivity) .

RTI(read time inspection)FQA Sampling .

RTV(Room Temperature Vulanizing) . 25, 60% .

Rubbing .

Run SplitRun , Run Wafer , .

RZ(Return to Zero) Pattern Data "1" "0" Palse .

SS/A(Service Area) Mainternance Area 1M-DRAM CALSS 100. Salt Spray " " =35, 5% Device Lead Frame Check .

SawingWafer 1/1000 Wafer X,Y .

S/C(Solder Coating)I.C lead lead .

ScannerBeam line lon Beam Beam .

Scanning Trigger Circuit Feedbac k .

Schematic . Simulator Text Netlist .

Schottky Barrier .

Schottky Diode , P-N Diode.

Schottky gate fetFET Gate , Schottky FET.

SCP

Gate PNPN .

ScrambleDevice Pin Test .

Scratch, .

ScreeningDEBUG, BURN-IN LOT .

Scibe Wafer Chip .

Scibe lineDie Sawing .

Scribing , Wafer ( , )

ScrubberWafer .

Scum Wafer .

SDA(Statistical Dafect Analysis)Process Wafer Fail(Row, Column, Bit fail) Feedback Data.

SDRAM(Synchronous DRAM) System Clock Data 10ns Access Time DRAM.

Seal Bonding Wire .

Seal PrintLCD Seal .

Search LevelDie Lead .

Second Bond Lead Frame Bond.

SECSDEVLoopback Test Simulator .

SECSIM(SECS Simulator)SECS Test PC Simulator.

SECSTESTLoopback Test Simulator HOST .

SECCPECSECS Protocol Specification Vendor .

SegmentNIXIE TUBE , , , . , .

Segment ON/OFF "8" .

SEG(Selective Epitaxial Growing) Epi Silicon Oxide .

Selective Diffusion() .

Selective Oxidation Process() .

Self Align Mask .

Self bias( ) .

Self RefreshDRAM Refresh Refresh Mode DRAM , Self Refresh DRAM Refresh T ime Refresh .

Self-AlignmentMOD Gate AL Melting Poing AL DEP. Themal Caycle . AL DEP Source Drain Drive-in . S/D Drive-In Gate Define Alignment Tolerrance Overlap Regio n S/D Parasitic Overlap Capac-itance Minimum size .

SEM(Semiconductor Equipment and Material Institute) , .

Semi-Auto Host CST LOAD/UNLOAD Opertor .

Semi-Custom Masker Cell Mask User IC/LSI IC.

Semiconductor. ( ) ( ) .

Sensor .

Sense AMPCell Data Data line voltage swing Data line Signal Am plifier.

Sequential Circuit()

GateNAND, NOR , Flip -Flop, Shift Register, Counter, Memory .

SER(Soft Error Rate)Memory Particle FIT .

SET(Summary of Electrical Test) TEST Information Sheet.

Set-up() . Set-up Mode Arc Energy lon Beam .

SF(Stacking Fault) .

SF(Spiral Flow) .

Sheath() .

Shelf() Stocker Cassett .

Shift RegisterRegister (Shift ) .

Shoe BoxCarrier 2 , carrier .

ShoomDevice graphic , 2 , Device pass/fail dotting Device .

Short Circuiting

.

Short Repair .

Shrink Chip .

SiC(Silicon Carbide) , Wafer Tube , .

Side Ball Bonding Wire .

Side Etch () .

Silicon 4 .

Silicon CompilerSystem master pattern IC .

Silicon GateGate , MOS .

Si Gate MOSMOS FET Gate (Poly) silicon MOS Device.

Silicon Nitride .

SIMM(Single In Line Memory Module)Edge connector .

Simulation Vector simulation input pin input netillist cycle

.

Single Crystal .

Single end lead .

Single In Line.Lead .

SIP(Single Inline Pkg)Memory Module Memory Modual, Pin Type Memory Module . Inserting .

SiteWafer .

SkewPin Timing.

SliceWafer . Silicon .

Slicer level , limitter level slicer . Slot() Carrier boat Wafer .

Sludge .

Smart Power IC Control IC .

Smock() Line .

SN(Spit Notice)RUN Spit Split .

SOA(Safe Operating Areas) .

Socket BoardJig (TEST PKG )

SOG(Sea of Gate)ASIC Unit Gate Array Channel . Metal D ie Unit Gate .

SOG(Spin On Glass)VLSI , , . SOG SOG 400 ~500 .

SOIC(Silicon outline Integrated Circuit) IC.

SOJ(Small Outline J-form Package)Device "J" LEAD PKG PCB .

Solder Ball .

Solder Coating , Frame Coating .

Soldering () PCB I.C , .

Soldering OilWafer Soldering Machine

.

Soler PreformDie Lead Frame .

Solder ResistPCB , Solder .

Soler Side() .

SortingWafer .

SOT(Small Outline Transistor) Transistor.

Space Charge .

SpacerLCD , .

SPARC(Scalable Processor Architecture)SUN MICRO 32 Bit RISC Processor.

Speed-Up CapacitorTR Inverter Speed-Up .

Spider bondingWireless Pattern Wafer .

SpikeSilicon Contact .

Spindle MotorBlade Wafer , . Air Bearing 30, 000RPM .

SPLC(Stocker PLC)Stocker Stocker Program .

SplitNormal RUN .

Split Word lineSRAM Cell Layout Design Asymmetry Word Line .

Sputtering Argon Gas Target Wafer .

Square OutWafer , Wafer .

S-RAM(Static RAM)Dynamic RAM . .

SSI(Small Scale Integration)10 Gate .

Stack . FAB Silicon .

Standard CellStandard Cell Cell , Chip semi-custom LSI Gate Array custom .

Standby .

Standby Current Drain .

Static Hold 2V Data Data Retention .

Static memoryMOS FET .

STC(Stocker Controller)Bay Cassette , Bay Cassette Bay Cassette Bay .

STD(Standard)

Stem TR , Header .

Stepper WF 1 Chip Chip . WF 1 .

STN(Super-Twisted Nematic) WF PC .

Storage Time () TR ON .

StressWafer .

Stringer Film Etch Residue .

StripWafer P.R , .

StrobeDevice Device Latch Timing.

Sub-Mask Mask Master Mask Mask

mask.

Substrate () , Wafer .

Substrate-ConcentrationWafer , Bulk .

Subtrative Process, , etching .

Supported Hole() .

Surface Agent .

Surface Concentration. Wafer .

Surface Passivation( ) PN . (ACTIVE) PN (PASSIVE) .

Surface Potential . Wafer .

Surge Current .

Synchronization() Timing .

SWMI(Side Wall Masked Isolation)LOCOS Isolation Oxide En-croachment , bird's Beak .

TTAB(Tape Automated Bonding)Tap Die .

TABTR IC 1mm TAB .

TapingWafer Tape ( ).

TCA Oxidation TCA .

TCP(Tape Carrier Package)IC Chip Tape Film TAB(Tape automated bonding) Package.

TEG(Test Element Group) Bread Board TR, Diode, .

Tenting Resist .

TEOS(Tetra Ethyl Ortho Silicate) Si Source .

Terminallon Source Cover .

Test HeadTester Handler Prober Station .

Test Mode Device Test Test Access Device , Test Test Time Test multi-bit test .

Test Pattern / Wafer Pattern.

Tester Computer .

Test OptionComputer .

Test Plan , , , Limit .

Test Program Wafer Program SPEC Program Software.

Test Schematic(Test Circuit)Jig .

Test System .

Test Vector Test Simulation Test Signal Set.

Test vehicle Mask.

Test Test Program Pass/Fail .

TestabilityChip Level Block Sub Block Test .

TF-EL Display (Thin-Film Electrolumines- cent Displays) , .

TFIC(Thin Film Integrated Circuit) 5 . .

TFT(Thin Film Transistor) FET.

TFT ArrayMatrix TFT .

Thermal Addressing .

Thermo-Optic Effect( ) . .

Thermotropic LC .

Thermal Relief() .

Thermal Shock Test() TR, Diode, IC .

Thermo Electric Effect() , , .

Thick Film IC( ) 5 .

Thin FilmThick Film ( 5 micro) .

3D Circuit Device LSI , DEVICE LSI Silicon LSI . 3 .

Threshold LevelInput Device .

Thyristor () PN 3 ON/OFF 2 OFF ON .

Tie barPKG Lead Bar.

Tilt , . .

Tilt Angle .

TimingDevice Comtrol Clock, Address, Data .

Tin PlatingSn Frame .

Tip Chip .

TiSiX (Titanium Silicide)Titanium silicon contact .

Tj(junction Temperature).

TN LCD (Twisted Nematic Liquid Crystal Display)90 LCD.

TN-FE LCD (Twisted Nematic Filed Effect LCD) 90 Twist LCD.

TNI. Clearing Point .

Tooling Hole .

Topology () Wafer .

TQFP(Thin Quad Flat Package) 1.0 mm 1.4mm QFP.

TR(Transformer) .

TransferLCD , Carrier Boat Wafer Carrier Boat .

Transfer CollectTape Die .

Transfer PrintNi-beads .

Transfer System. RUN SHOE BOX Wafer .

Transition timeDevice level level A.C .

TransistorEmiter Collector base base carrier .

Transition .

Trapcarrier .

Trench . FAB , Silicon .

Triangular Voltage Sweep MethodGate mobile ion oxide current gattte bias oxide check .

Triger .

Trim/FormPackage lead 90 I.C .

Tristate output Level High Low High Impedance .

TSOP(Thin Small Outline Package)Package 1.0mm SOP(SOIC) P-DIP PACKAGE SYSTEM .

TS(Tensile Strength) .

TTL(Transistor Transistor Logic) . .

TTV(Total Thickness Variation) (wafer)

TunnelingBisas PN, Oxide Energy Band Gap Electron Hole .

TV RUNTest Vehicle Wafer.

TweezerWafer ( Vacumn Tweezer )

Twist angle Cell .

UUART(Universal Asynchrnous Receiver & Transmiter) LSI Interface .

UJT(Unjunction TR)Junction 1 Base 2 TR.

Ultra Filter2 Particle Filter.

Ultrasonic Cleaner () .

Under CoatingLCD SiO2 . SiO2 . MASK LAYER .

Undershoot Noise 0V NOISE, 0V NS Pulse Negative Latch-up .

Uni-Biopolar IC - TR .

Unipolar Transistor FET .

Unloader Frame Magazine Frame .

UnloadingLoading Wafer Tweezer Transfer Arm CARRIER BOAT .

UPS(Uninteruptable Power Supply) .

UV(Ultra Violet,) Energy .

VVacumn TubeTransistor , , , , Transistor IC .

Vacuumn TweezerChip Carrier .

Valence Band () .

Valence Electron() .

Vane DamperFan .

Varistor .

Vcc (Supply Voltage) . Device Device Device .

Vector Simulation Input Pin Input Netilist Cycle .

Vector AddressPattern Memory Pattern Address.

Verical TR( ) ( ) . .

VFD(Vacumn Fluorescent Display) . .

VIA Metal lnsulating filed Contact.

VIA not OPEN METAL LAYER PROCESS VIA CONTACT UNDER ETCH Metal Layer Contact SPEC .

Via holePCB .

Viewing Angle . LCD.

Virtual Cieaing Point( ) .

Viscosity , . .

Visual inspection Chip Device .

VoidRTN (). FAB SPACE .

VssDevice Device Vcc Clock Device Signal .

VTD Depletion TR VTH.

VTH(Threshold Voltage).

VTNNatural TR VTH.

VTPC(Vertical Probe Card)Wafer Test Device PAD Needle Probe Card Probe Card Needle .

WWafer (Si) .

Wafer CarrierWafer , .

Wafer IDRUN Wafer Wafer .

Wafer SortWafer Level GO/NO-GO Test , Test Wafer Probe Prober Card Test .

Wafer Storage Box (Wafer) Wafer Carrier Box.

Wave Form Wafer lon Beam .

Wave Soldering .

Wedge Bonding .

WellCMOS Technology N-Channel Transistor P-Channel Transistor Si-Substrate N P-Channel Transistor substrate.

Wet Etch. .

Wet SinkWafer .

Wetting .

WI(Wire Inspection)Bond .

Wide Bit8bit I/O Byte Word Dar Device .

WIP(Work In Process)()

Wire BonderTR IC Wire Bonding Wire Bonder .

Wireless Bonding .

Work Function .

Work HolderLead Frame Loader Magazine Die Unloading Magazine .

Work stationWF .

Worm(1 : Write once Read many) .

WriteEPROM EEPROM Floating Gate Bit .

WSI(Wafer Scale Integration)Wafer Chip Wafer .

WSTS(World Semicondiuctor Trade Statistics) . .

XXylne or Way Coat (resist) .

YYield

Wafer Wafer 1 Wafer Chip Wafer Test Chip .

ZZenor breakdownPN Diode 0 . .

Zenor . PN Diode , . . , . .

Zero ohm resistorSIMM PD Pin Chip Connector ZERO OHM RESISTOR .

ZIP(Zigzag In-line Package)Package Type Package Lead Zigzag Device .

Zone AHU(Zone Air Handing Unit) FAB Return FAB Air .