JENOPTIK Laser, Optik, Systeme GmbH - lastek.co.kr · 9Automotive Sensor 9Embedded Electronics 9100nm~1um: 40Gbits/in² 9Sub-100nm: 100Gbits/in² 9Programmable device 9Multiple tests
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JENOPTIK Laser, Optik, Systeme GmbH
JENOPTIK Laser, Optik, Systeme GmbH
Was established on July 1, 1995 as 100% subsidiary of the JENOPTIK AG.
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JENOPTIK Laser, Optik, Systeme GmbH
About JENOPTIK
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JENOPTIK Laser, Optik, Systeme GmbH
Carl Zeiss sets up workshopfor precision mechanicsin Jena
Ernst Abbe, professor at the university of Jena, joins the company,designing microscopes
Ernst Abbe established theCarl-Zeiss-Foundationin Jena
Zeiss Jena is convertedinto a state-owned enterprisedoing business in the name of VEB Carl Zeiss Jena
JENOPTIK GmbH
JENOPTIK AG
Jenoptik Carl Zeiss JENA GmbH
splits up into:
Carl Zeiss JenaGmbH
JENOPTIK GmbH
1846 1866 1889 1948 1990 1991 1995
The state-ownedKombinat VEB Carl Zeiss JENA
is converted into
JENOPTIK Carl Zeiss JENA GmbH
197319641960
History of JENOPTIK
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JENOPTIK Laser, Optik, Systeme GmbH
JENOPTIK AG
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JENOPTIK Laser, Optik, Systeme GmbH
Jenoptik Technology-Center Jena/Germany
Export Ratio: 80%
Pioneer and Market leader: Developing Imprinting Technology since 199276 Jenoptik HEX_Systems // 43% market share
JENOPTIK PC Micro Engineering
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JENOPTIK Laser, Optik, Systeme GmbH
Portfolio - PC Mikrotechnik
HotEmbossingSolutions
HEX01HEX02HEX03HEX04
UV-Modul
LithographySolutions
X-Ray ScannerDEX02DEX03DEX04
MonochromatorMGU1MGU2
complete Beamlinepartner Bestec GmbH
Applications & Service
Manufacturing,Planing &
Process Assistance
micro/nano components:
optical: e.g. lenses, gratings, holograms
fluidic: e.g. channels, life science, PCRs
continuous development of technology &
equipment
partner University Freiburg
Portfolio
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing Solutions
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing Process Schematics
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JENOPTIK Laser, Optik, Systeme GmbH
HE Temperature Pattern Chart
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JENOPTIK Laser, Optik, Systeme GmbH
HE - Process Schematic at Jo-MT
Precise Engineering
> 100m
High Resolution Tech.
LIGA / UV-LIGA
ToolDesign
Si-Machining - Wet Etch-Dry Etch
Substrate & Tool Heating
> TG
Press Tool on the
Substrate20kN-200kN
Cooling-AEROSOL
De-Embossing-O2-Purging
Next Step-Bonding- Dicing
Master- Ra down to 100nm- Bending down to 20m
Vacuum
Condition
Process
Chemical sealing- glue, solvents- Thermal
ActiveDe-Embossing
Most criticalstep
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JENOPTIK Laser, Optik, Systeme GmbH
Polymers used for Micro Molding
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing Process Schematics Hot Embossing
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing Process Schematics Force
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing Process Schematics De-Embossing
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JENOPTIK Laser, Optik, Systeme GmbH
Polymer Micro and Nano-patterning
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing Products Line-up
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing Solution HEX01
HEX 03
HEX 01
Cost effective entry system with tabletop layout
Pressing force of up to 20kN (50kN Option)
Embossing temperature up to 320C (500C Option)
Mold non-orthogonality compensation
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing Solution HEX02
HEX 03
HEX 02
Medium range system
Pressing force up to 200kN (250kN Option)
Embossing temperature up to 320C
(500C Option)
Mold non-orthogonality compensation
Suggestive user interface with macro
script language
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing Solution HEX03
HEX 03
High-end embossing solution
Pressing force up to 200kN (250kN Option)
Embossing temperature up to 320C
(500C Option)
Temperature stability +/- 1C
Maximum substrate diameter 180mm
Cleanroom compatible
Active De-embossingTM
Optical alignment with +/- 2m overlay accuracy
HEX 03
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing Solution HEX03
HEX 03 Chamber (Top)
HEX 03 Chamber (Bottom)
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing Solution HEX04
HEX 04
Max Substrate Size 300mm in diam.
Thickness of Sandwich up to 20mm
Max Press Force up to 400kN (600kN opt.)
Embossing Temperature up to 500C
Cycle Time typically 3 min
Temperature Stability +/- 2C
Optical Alignment +/- 2m overlay accuracy
Cleanroom Compatible
Active De-embossingTM
Handling Unit
UV Unit
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JENOPTIK Laser, Optik, Systeme GmbH
>90
With Active De-Embossing Unit
Without Active De-Embossing Unit
90.90.
Key Feature - Active De-Embossing UnitTM
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JENOPTIK Laser, Optik, Systeme GmbH
Double Side Embossing with Alignment
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JENOPTIK Laser, Optik, Systeme GmbH
SensLab Tool - Double Side Embossing
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JENOPTIK Laser, Optik, Systeme GmbH
Glass Embossing (1)
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JENOPTIK Laser, Optik, Systeme GmbH
Glass Embossing (2)
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JENOPTIK Laser, Optik, Systeme GmbH
Micro and Nano Optic Applications
Feature size < 100nm
+ Optical Filter - Gratings
+ Binary optics
+ Lenses for CD/DVD
+ Aligned Double-Side Embossing+ Nano-precise Surface Forming+ Excellent Uniformity
Glass Master+ E-Beam written+ Aspect Ratio: 1-50+ Feature Size: 30nm - 50m+ price: up to 10k
70 nm line space, AR 1
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JENOPTIK Laser, Optik, Systeme GmbH
UV-Unit Technology Development
UV-Source High Brightness LED ArrayWavelength 365nmEmbossing Temperature Ambient up to 100CExposure area 150mm diameter (HEX_01)
Up to 300mm (HEX_04)Uniformity (150mm) < 5%Force < 10N up to 10kN
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JENOPTIK Laser, Optik, Systeme GmbH
Master Manufacture
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JENOPTIK Laser, Optik, Systeme GmbH
Master Manufacturing
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JENOPTIK Laser, Optik, Systeme GmbH
Master Silicon Master
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JENOPTIK Laser, Optik, Systeme GmbH
Masters fabricated with silicon dry etching
Detail of Silicon Embossing Tool Resulting Microchannel
Hot Embossing with Si-Master small feature(1) Microfluidics Capillary Electrophoresis Chips
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JENOPTIK Laser, Optik, Systeme GmbH
Embossed microchannel array
Replicated channels in PMMA Height: 5 m
Width: 0.8 mH.Becker, K. Lowack, A. ManzImperial College, London, IMM Mainz
Embossing tool: Silicon
Hot Embossing with Si-Master small feature(2) high aspect ratios
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JENOPTIK Laser, Optik, Systeme GmbH
23m
83m
Fluidic ChannelsPMMA
Hot Embossing with Si-Master small feature(3)
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing with Si-Master small feature(4)
AR: 1,5Application: Coordinates Mash for Cell-Structures
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JENOPTIK Laser, Optik, Systeme GmbH
Nickel Master:manufactured byElectroplating and LIGA
Master Nickel Master
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JENOPTIK Laser, Optik, Systeme GmbH
LIGA-Tool Material: PMMA Height: 150 mm AR: 5
Hot Embossing with Ni Master(1)
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JENOPTIK Laser, Optik, Systeme GmbH
LIGA-Tool Material: PMMA Height: 150 mm AR: 5
Hot Embossing with Ni Master(2)
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JENOPTIK Laser, Optik, Systeme GmbH
LIGA - Tool:AR: > 20smallest structure: 7mheight: 150m
Capacitive Accelerator-Sensor
Hot Embossing with Ni Master(3)
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JENOPTIK Laser, Optik, Systeme GmbH
LIGA - Tool:AR:19 smallest structure: 8m height: ca. 150m
Capacitive Accelerator-Sensor
Hot Embossing with Ni Master(4)
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing with Ni Master(5)
Tool Manufacturing: ElectroplatingNi in Si-Wafer
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing Applications
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JENOPTIK Laser, Optik, Systeme GmbH
MolecularElectronics
Optical Device
Optical MediaMagnetic Media
Laboratories On A Chip
Semiconductor
NanoScale
Pattern
Optical Communications
Wave-guidesOptical filter
Computer Network Solution
Laser pickup readout system
DVD, DVR: Blue-Ray LensOptical LensPrism Sheet
Automotive SensorEmbedded Electronics
100nm~1um: 40Gbits/in
Sub-100nm: 100Gbits/in
Programmable deviceMultiple testsSmaller amounts of
material and More efficient result
Challenge for MoorsLaw
Miniaturizations
Material Characters
Application Diagrams
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JENOPTIK Laser, Optik, Systeme GmbH
Solutions for commercial applications
Microoptic Microfluidic Micromechanic
L.O.S fiber
Cannon
Fuji
Blusi
Bosch
JENOPTIK PC MT
LSU
LTU
JENOPTIK PC MT
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing ApplicationsMicro-fluidic & Bio-MEMS Applications
Micro-optic ApplicationsMicro-mechanic Applications
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JENOPTIK Laser, Optik, Systeme GmbH
Application based on Polymer MEMS
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JENOPTIK Laser, Optik, Systeme GmbH
Embossing Materials for u-fluidic
Acronym Full name Temp.Stability in OC Proberties Structure
COC Cycle-olefine/copolymer 140Hightransparency
Amorphous
PMMA Polymethylmetacrylate 80 HightransparencyAmorphous
PC Polycarbonate 130 HightransparencyAmorphous
PS Polystyrene 80 Transparent AmorphousPOM Polyoxymethylene 90 Low Friction Semi Crystalline
PFA PolyfluoralkoxyCopolymer 260High Chemicalresistive
Semi Crystalline
PVC Polyvinylchloride 60 Cheap Amorphous
PP Polypropylene 110 MechanicalPropertiesSemi Crystalline
PET PolyethyleneTerephtalate 110Transparent, Lowfriction
Amorphous/SemiCrystalline
PEEK Polyetheretherketone 250 High Temp.ResistivitySemi Crystalline
PA Polyamide 80-120 Good mech.PropertiesSemi Crystalline
PSU Polysulfone 150 Chemical andTemp. ResistivityAmorphous
PVDF Polyvinylideneflouride 150 Chemically inert,piezo-electricSemi Crystalline
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JENOPTIK Laser, Optik, Systeme GmbH
In 2007 75% of all fluidic applications are done in Polymer
Materials for -Fluidics Applications
63%63%
81%
63%
16%
38%
59%
59%
75%
0%
20%
40%
60%
80%
100%Si
Polymer
GlassMetall
Ceramics
2002/03 >2007
Embossing Materials for u-fluidic
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JENOPTIK Laser, Optik, Systeme GmbH
Lactate Scout Alcohol Drugs Oestrogen
Application(1) - Fluidic (SensLab)
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JENOPTIK Laser, Optik, Systeme GmbH
Continous Flow PCR SystemAndreas Manz, IC London
Batch PCR ReactorLarry Kricka, Univ. PennsylvaniaClaudia Grtner, AMT Jena
Application(2) - Fluidic : PCR Reactors Batch/ContinousFlows
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JENOPTIK Laser, Optik, Systeme GmbH
Application(3) - Fluidic : IZM Waveguide
0%
10%
20%
30%
40%
50%
60%
500 600 700 800 900
Wavelength (nm)
Tran
smis
sion
unfilled fluidic channel
filled fluidic channel
Master: milled brass
Channel width: 250mChannel depth: 250m
Waveguide width: 250mWaveguide thickness: 250m
Hot Embossed PMMA
light
fluid
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JENOPTIK Laser, Optik, Systeme GmbH
Feature Size
[30 nm ~ 500 m]
Structure for:
separation
mixing
filtering
passive Valves
chambers
Inlet
Analytic-read out
Application(4) - BioMEMS : Analytic Chip
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JENOPTIK Laser, Optik, Systeme GmbH
Nano Structure realized with acommercial HEX03 Hot Embossing System
PMMA120nm pitch60nm lines
120nm depthaspect ratio 1:2
Application(5) Nano Embossing
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JENOPTIK Laser, Optik, Systeme GmbH
Optical fibre(50 m core)
Multilevel Master polymer embossed micro-fluidic channels with integrated optical fibres
Application(6) - Fluidic : with Integrated Optics
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JENOPTIK Laser, Optik, Systeme GmbH
Masters fabricated with silicon dry etchingMaster structure Embossed part in PMMA
Application(7) - Fluidic : Microfluidic Mixer
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JENOPTIK Laser, Optik, Systeme GmbH
Application(8) - Fluidic : Cover lid bonding
Cross-section of a single micro channel
Device filled with liquid
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JENOPTIK Laser, Optik, Systeme GmbH
Hot Embossing ApplicationsMicro-fluidic & Bio-MEMS Applications
Micro-optic ApplicationsMicro-mechanic Applications
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JENOPTIK Laser, Optik, Systeme GmbH
Solutions for Manufacturing ofMicro-Optical Components
Aligned Double-Side Embossing
Nano-precise Surface Forming
Pneumatic Soft Deembossing
Excellent Uniformity
Application Micro-Optical Components(1)
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JENOPTIK Laser, Optik, Systeme GmbH
Application Micro-Optical Components(2)
Molds
Limits
CoolingHeating
Alignment
De-Embossing
Mold (Bottom) for 52 Lenses
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JENOPTIK Laser, Optik, Systeme GmbH
Application Micro-Optical Components(3)
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JENOPTIK Laser, Optik, Systeme GmbH
Application Micro-Optical Components(4)
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JENOPTIK Laser, Optik, Systeme GmbH
Appication - Microspectrometer
Glasfaser
Lichteinkopplungi - x
Lichtauskopplungmit 45 -Kante
photodiode array
selffocussingreflexiongrating(d=0,2 m; g=2 m
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JENOPTIK Laser, Optik, Systeme GmbH
Application - Refractive Optical Array
Material: RT 133
Structure depth: 45 m
Lattice constant: 30 m
Filling factor: > 98 %
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JENOPTIK Laser, Optik, Systeme GmbH
1. Goal (was): New applications of optical data storage (next generations after CD, DVD) Optics and/or the assembly around the pure optic components Blue ray disc, 405 nm Lens: NA 0.85, shape accuracy: Lambda/4, roughness 10. 20 nm Cost effectiveness of production: better the with a 16 fold injection molding technology
2. Market/Costumer In principle. 2002: Matsushita, Mitsubishi, Pioneer, Philips, Sony, Thomson, LG Electronics, Hitachi, Sharp and
Samsung define a 25 Gbytes standard, the numerical aperture (NA) of the lens is 0.85 Toshiba und NEC develop a DVD follower And so on.... Thomson was a partner in the project
3. Results 25 and 52 fold embossing assembly Ca. 1 dozen mold insert techniques were tested Yield 85 % Shape accuracy:
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JENOPTIK Laser, Optik, Systeme GmbH
University FreiburgDr. Claas MllerManaging Director of the Chair of Process Technology
Paul Scherer InstitutDr. Helmut SchiftHead of Micro and Nano Structuring Group
Luisiana State UniversityDr. Jost GoettertDirector for Microfabricationat the CAMD
Forschungszentrum KarlsruheDr. Matthias HeckeleHead of the MicrofluidicDepartement
PC MikrotechnikMr. Frank ReutherHead of the R&D Department
Technology Advisory Board Members
Mission:Establishing equipment concepts for state-of-the-art Hot Embossingand Nano Imprinting Technology requirements!
Technology: Full size substrate thermal and UV-Imprinting
Applications: -Fluidics, -Optics, portableHDD
Process: Nano StructuresHigh Aspect RatiosMicro StructuresResidual LayersImprinting
Materials: PMMA, COC, PC, Glass, etc.
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JENOPTIK Laser, Optik, Systeme GmbH
Strategic Partners
ForschungszentrumKarlsruhe
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JENOPTIK Laser, Optik, Systeme GmbH
Leading Research Centers for MEMS, Micro Optical and Bio-Nano Developments
University of California Irvine, USA
Stanford Microfluidic Labs, USA
Berkeley Nanotechnology Labs, USA
Paul Scherer Institut (PSI), CH
IMTEK Freiburg, Germany
UCLA, USA
Pusan National University, Korea
ITRI, Japan
ETRI, Korea
Matsushita Central Research , Osaka, Japan
Mitsubishi Advanced Technology R&D Centre, Osaka, Japan
Hong Kong Productivity Council, Hong Kong SAR
SSLS / National University Singapore, Singapore
MEMS Exchange / CNRI, Washington, USA
Foundation Tekniker, Bilbao, Spain
Forschungszentrum CAESAR Bonn,Germany
K.E.T.I. Seoul, South Korea
Forschungszentrum Karlsruhe, Germany
University Turin, Italy
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JENOPTIK Laser, Optik, Systeme GmbH
JENOPTIK Mikrotechnik GmbH - WorldWide Installations
Dedicated Micro- & Nano-Hot Embosing Solutions
51 Systems Installed
( sometimes multiple)
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JENOPTIK Laser, Optik, Systeme GmbH
New!! JENOPTIK LAB MEMBERSHIP
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JENOPTIK Laser, Optik, Systeme GmbH
Contacts
Thank you very much for your attention !
Enrico PiechotkaDirector Marketing & SalesPC Mikrotechnik
Phone: +49-3641-65 3042Telefax: +49-3641-65 3562Mobile: +49-173-6921451enrico.piechotka@jenoptik.comwww.jo-mt.com
Phone: +82-32-623-6320Telefax: +82-32-623-6325Mobile: +82-10-5490-5460jhkim@kortherm.co.krwww.kortherm.co.kr
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