ARC Tri-fold Brouchure › ... › tri-fold-brochure-1-12.pdf · • Amplified femtosecond Ti:sapphire 10 nm HfO 2 tube-in-tube structure by ALD • Q-switched Nd:YAG • CW Nd:YAG
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MissionTo be the leader in research, development, and education, concentrating on laser and
l li ti d d d t i l
FacultyDr. Hani E. Elsayed-Ali Professor of Electrical Engineering and Eminent Scholar, Director of Applied Research Center
APplasma applications and advanced materials.
Working to Innovate
What we are doing:Nanotechnology/quantum dots
Scholar, Director of Applied Research CenterUltrafast laser-based measurements; laser processing, thin film and nanocrystal fabrication; pulsed laser deposition; semiconductor surface preparation and characterization; electron emitters and electron gun design; and thin film and laser-based sensors
Dr. Helmut BaumgartNANOTECHNOLOGY
PPLI
Thin filmsMaterials characterizationLaser micromachiningAdvanced sensors Ultrafast laser diagnosticsNanotechnology for lab-on-a-chip applicationsElectronic materials
Virginia Microelectronics Consortium Endowed Chair, Department of Electrical and Computer Engineering Nanotechnology; microelectronics fabrication; high-k dielectrics for advanced gate stack engineering; atomic layer deposition (ALD) technology of electronic thin film materials; semiconductor device processing; thin film
ED
RElectronic materialsHigh-k dielectricsAlternative renewable energy and
bioapplicationsElectron beam lithographyVUV lithographySolar cells and photodetectors
growth; ALD of ZnO for detector and sensor applications
Dr. Abdelmageed ElmustafaAssistant Professor of Mechanical EngineeringNanoscale mechanical behavior of materials; nanoindentation (metals, polymers, alloys, interconnects); dislocation and strain gradient plasticity; thin films (mechanical properties and characterization); modeling
THIN FILM DEPOSITION
RESEp
Negative electron affinity photocathodesLaser induced breakdown spectroscopyFemtosecond laser technologyCarbon nanotubes and nanoparticlesSurface modification with plasmas
(mechanical properties and characterization); modeling and simulation (nanoindentation creep and contact mechanics); RF accelerators breakdown
Dr. Wes LawrenceAssistant Professor of Engineering TechnologyAdvanced material concepts utilizing nanoinclusions and periodic structures of materials to develop materials with
EARC
periodic structures of materials to develop materials with novel electromagnetic properties; creating lightweight and flexible EM shielding materials, structurally integrated antenna concepts
Dr. Sylvain MarsillacAssociate Professor of Electrical and Computer Engineering
MATERIALS CHARACTERIZATIONDr. Hani E. Elsayed-Ali, Director
A li d R h C t
H
CEEngineering
Solar cells, new inorganic materials for renewable energyapplications, innovative tools for in-situ and real-time analysis, novel architectures and techniques for the fabrication of flexible and high efficiency solar cells, materials characterization
Dr. Gon Namkoong
C C O
Applied Research CenterFrank Batten College of
Engineering & TechnologyOld Dominion University12050 Jefferson Avenue
Applied Research CenterFrank Batten College of
Engineering & TechnologyOld Dominion University12050 Jefferson Avenue
Newport News, Virginia 23606Phone: (757) 269-5643
ENTEDr. Gon Namkoong
Assistant Professor of Electrical EngineeringDevelopment of nitride/ZnO-based materials and devices on innovative substrate materials as well as applying new growth techniques to facilitate material and device improvements
050 JNewport News, Virginia 23606
(757) 269-5643
Phone: (757) 269 5643Fax: (757) 269-5644
E-mail: helsayed@odu.edu Web site: http://www.eng.odu.edu/arc
R
In the Laboratory
ARC has established 18 labs with equipment and facilities valued in excess of $6 million.
Fabrication and Analysis
Stepper motor
Target holder
Cracker source
RHEED intensity during growth of In-(4×3) filmSi(100)-(2×1)Si(100)-(2×1) In-(4×3)In-(4×3)
THIN FILM & NANO PARTICLE FABRICATION• Atomic layer deposition (ALD)• Molecular beam epitaxy (MBE)• Pulsed laser deposition (PLD)• Multi-target sputtering• Laser ablation Femtosecond
Electrongun
CCD camera
RGA
RHEED screen
e-beam
Diffractede-beam Species
plume
Focused laserbeam
Half-wave plate
Polarizer
Pulsed laser deposition (PLD)
D in
tens
ity (a
rb. u
nit)
65
70
75
80
85 8.6 keVSpecular peak[010] direction
Laser ablation• ECR plasma deposition • Chemical vapor deposition• Electron beam evaporation• Plasma and ion beam deposition • Ion beam etching• Electron beam lithography (EBL)
Femtosecond laser system
Substrate holderPulse width = 130 fsλ = 800 nm Time (s)
20 40 60 80 100 120 140 160 180 200 220 240 260
RH
EE
D
55
60Laser on
Nanoindenter XP from MTS
A triangular Berkovich diamond tip impression
• Photolithography
MATERIALS ANALYSIS• High resolution transmission electron
microscope (HRTEM)• Nanoindentation• Scanning electron microscope (SEM)
Probe station and Agilent B1500A semiconductor device analyzer Scanning probe
i (SPM)• Scanning electron microscope (SEM)• Probe station for electrical device testing &
semiconductor device analyzer• Optical microscope • Atomic force microscope (AFM)• Scanning tunneling microscope (STM)• X-ray photoelectron spectroscopy (XPS)
Atomic layer deposition (ALD)
HfO2 thin film on Siby ALD
ymicroscope (SPM)
ay p otoe ect o spect oscopy ( S)• Time-of-flight mass spectrometer • Raman & optical spectrophotometer• Ellipsometer
LASERS• Amplified femtosecond Ti:sapphire
10 nm
HfO2 tube-in-tube structure by ALD
• Q-switched Nd:YAG• CW Nd:YAG• CO2• Excimer• Argon ion • High power diode JEOL 6060LV
SEM equipped
Ag nanoparticle
SEM equipped with Raith
electron beam lithography
JEOL 2100 field emission
HRTEM
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