Size Nano Colloids Precisely and Quickly Liquid Nanoparticle Sizer (LNS) System Model 9310 NANOPARTICLE MEASUREMENT SOLUTIONS • 6 – 360 nm measurement range in under 5 minutes • Actual quantitative concentrations • Any particle, any shape, any composition, any distribution (including multimodal) • Great for CMP slurry, resin rinse, bio-pharma, and filter characterization, monitoring, and control Industry Recognition • C79-0113 Guide to Evaluate the Efficacy of Sub-15 nm Filters Used in Ultrapure Water (UPW) Distribution Systems • C93-0217 Guide for Determining the Quality of Ion Exchange Resin Used in Polish Applications of Ultrapure Water Systems CMP Slurry Characterized with the LNS System Multi-Mode CMP Slurry Measurement Particle Diameter (nm) Differential Volume Concentration d (nm 3 /mL /d log (D P ) 2.0e+16 1.8e+16 1.6e+16 1.4e+16 1.2e+16 1e+16 8e+15 6e+15 4e+15 2e+15 0 10 20 30 40 50 60 70 80 90100 Multi-mode colloids are easily distinguished 30 nm Rated Water Filter Challenged with 2E8 #/ml (6 ppm) 30 nm Particles Fractional Coverage (Monolayers) Retention (%) 100 80 60 40 20 0 0.000 0.025 Silica PSL Gold 0.050 0.075 0.100 0.125 0.150 0.175 0.200 Filter retention depends on the challenge particle UPW Rinse of Ion Exchange Resin Flush Volume (Liters UPW) Cummulative Particle Concentration Added (#/mL >10 nm) 1e+9 1e+8 1e+7 1e+6 1e+5 1 10 100 1000 Resin A Resin B Resin C Resin D Resin E Resin F Spool Resin rinse times vary widely Filter Performance Testing Resin Rinse Benchmarking Data prepared and presented by CT Associates to the SEMI Ion Exchange Task Force on 02/27/2014 Van Schooneveld et. al., American Filtration Society Spring Conference, Minneapolis, MN, 2013 Van Schooneveld et. al., Nanotech 2011: Technical Proceedings of the 2011 Nanotechnology Conference and Expo
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NANOPARTICLE MEASUREMENT SOLUTIONS Liquid Nanoparticle ... · Liquid Nanoparticle Sizer (LNS) System Model 9310 NANOPARTICLE MEASUREMENT SOLUTIONS • 6 – 360 nm measurement range
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Size Nano Colloids Precisely and Quickly
Liquid Nanoparticle Sizer (LNS) SystemModel 9310
NANOPARTICLE MEASUREMENT SOLUTIONS
• 6 – 360 nm measurement range in under 5 minutes
• Actual quantitative concentrations
• Any particle, any shape, any composition, any distribution (including multimodal)
• Great for CMP slurry, resin rinse, bio-pharma, and filter characterization, monitoring, and control
Industry Recognition• C79-0113 Guide to Evaluate the Efficacy of Sub-15 nm Filters Used in Ultrapure Water (UPW) Distribution Systems• C93-0217 Guide for Determining the Quality of Ion Exchange Resin Used in Polish Applications of Ultrapure Water Systems
CMP Slurry Characterized with the LNS System
Multi-Mode CMP Slurry Measurement
Particle Diameter (nm)
Diffe
rent
ial V
olum
e Co
ncen
trat
ion
d(n
m3 /m
L/d
log
(DP)
2.0e+16
1.8e+16
1.6e+16
1.4e+16
1.2e+16
1e+16
8e+15
6e+15
4e+15
2e+15
010 20 30 40 50 60 70 80 90 100
Multi-mode colloids are easily distinguished
30 nm Rated Water FilterChallenged with 2E8 #/ml (6 ppm) 30 nm Particles
Fractional Coverage (Monolayers)
Rete
ntio
n (%
)
100
80
60
40
20
00.000 0.025
SilicaPSLGold
0.050 0.075 0.100 0.125 0.150 0.175 0.200
Filter retention depends on the challenge particle
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Refer to individual product sheets for component details.Computer not included.
Specifications subject to change without notice. The LNS System was developed in collaboration with CT Associates, Inc. The LNS System uses a soft X-ray charge conditioner.
Particle Diameter
Conc
entra
tion
Aerosolization Particle Size Distribution Measurement
Integrated Software Platform - Kanolysis• All-in-one control of the LNS system• Automated sampling sequence• Real-time data analysis
Patent Protected• Patent numbers 8,272,253 and 8,573,034 have been issued to CTA and licensed by Kanomax. • Kanomax has applied for additional domestic and international patents for technology contained within the LNS System. • Patent number 7,852,465 has been issued to Kanomax.