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Micro-jet Plasma CVD Kamel Silmy Mühlleithen 20.03.2003
13

Micro-jet Plasma CVD

Jan 05, 2022

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Page 1: Micro-jet Plasma CVD

Micro-jet Plasma CVD

Kamel Silmy

Mühlleithen 20.03.2003

Page 2: Micro-jet Plasma CVD

Seite 2

Micro-jet Plasma CVD

Content

• Motivation

• µjPCVD principle

• Equipment

• First experiments

§ MW, RF excitation

§ Hydrocarbon deposition

§ HMDSO/ O2• Outlook

Page 3: Micro-jet Plasma CVD

Seite 3

Micro-jet Plasma CVD

Motivation

• Localized deposition

§ write optical wave-guides

§ tribological coating (micro-gear)

§ ...

Page 4: Micro-jet Plasma CVD

Seite 4

Micro-jet Plasma CVD

pressure

Principle of µjPCVDRF

gas

• gas jet from a capillary§ HMDSO/ O2§ acetylene§ ...

• excitation§ plasma§ UV§ ...

• local deposition• „writing“ of structures

possibly with changing properties

energy

d

d

flux, p

l, Ø

• plasma parameters

• fluid dynamics parameters

Page 5: Micro-jet Plasma CVD

Seite 5

Micro-jet Plasma CVD

ParametersA B

capillarydiameter 0,1 mm 0,1 mmcross sect ion 7,9E-03 mm2 7,9E-03 mm2

length 200 mm 200 mmdistance to substrate 20 mm 10 mm

gasf lux in the capillary 10,56 sccm 6 sccmspeed inlet (206 kPa) 22,41 m/s 13 m/sspeed out let (23 kPa) 134,61 m/s ???chamber pressure 1 mbar 0,6 mbar

excitat ion t ime atspeed out let capillary 149 µs ??? µsspeed of sound (air) 61 µs 30 µs

• gas jet from capillary§ acetylene (A)§ HMDSO/ O2 (B)

Page 6: Micro-jet Plasma CVD

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Micro-jet Plasma CVD

Gas velocity in the capillary

• length: 0.1 m

• inner diameter: 100 µm

• inlet pressure: 206 kPa

• chamber pressure: 0.1 kPa

0,00 0,02 0,04 0,06 0,08 0,100

50

100

150

200

0

20

40

60

80

100

120

140

Pres

ure

(kPa

)

X in the capillary (m)

Acethylene flow in the capillary

Ave

rage

vel

ocity

(m/s

)

Substrate Capillary

Mach disc

Page 7: Micro-jet Plasma CVD

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Micro-jet Plasma CVD

Equipment• cross chamber

• vacuum pump (16,5 m³h-1)

• motorized x-y-z stage

• magnetron

• waveguide

• tuner

• microcapillary

§ inner diameter: 200 - 50 µm

§ length: 20 - 5 cm

Page 8: Micro-jet Plasma CVD

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Micro-jet Plasma CVD

First Experiments

• Microwave excitation (2.45 GHz)

§ Power supply: up to 850 W

§ Plasma ignition: from 60 W

• RF excitation (13.56 MHz)

§ Power supply: up to 650 W

§ Plasma ignition: from 3 W

§ Capillary between 2 parallel electrodes

Page 9: Micro-jet Plasma CVD

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Micro-jet Plasma CVD

Acethylene: MW, RF

• MW 80 W (left)

• Pchamber: 1 mbar

• flux: 10.50 sccm

• 20 mm substrate-capillary

• 60 s

Black deposition

Too high power

Peak deposition: less energy

• RF 10 W (right)

Page 10: Micro-jet Plasma CVD

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Micro-jet Plasma CVD

Hydrocarbon shape RF excitation, capillary between two parallel electrodes

• 10 W • 10.50 sccm • 1 mbar • 60 s

• Double peak deposition

§ Bias: -16 V

§ 20 mm capillary to substrate

• Single peak deposition

§ Bias: 0 V

§ 9 mm capillary to substrate

Page 11: Micro-jet Plasma CVD

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Micro-jet Plasma CVD

HMDSO/ O2 RF excitation, capillary between two parallel electrodes

• 20 W • O2: 10.50 sccm • 15 s

• HMDSO: 6 sccm

• 0.6 mbar

• Single peak

§ Bias: -170 V

§ 9 mm capillary to substrate

Page 12: Micro-jet Plasma CVD

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Micro-jet Plasma CVD

Outlook

• SiOx and TCO (Transparency Conducted Oxide) deposition§ MW§ RF

• gas stream simulation§ Mach disc situated§ underexpanded stream

• optimal parameters for deposition§ focused

§ pressure§ power§ flux§ distance§ ...

§ shape with different capillary

CapillarySubstrate

Mach disc

Page 13: Micro-jet Plasma CVD

Thank you